A predictive kinetic model for the chemical vapor deposition of TiSi2

Journal of the Electrochemical Society

Volumn 143, Issue 5, 1996, Pages 1726-1736

  Southwell, R P ^a   Seebauer, E G ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DESORPTION; GASES; MATHEMATICAL MODELS; OPTIMIZATION; PRESSURE; REACTION KINETICS; STOICHIOMETRY; TEMPERATURE; VACUUM;

KINETIC MODEL; MASS BALANCES; MODEL PREDICTIONS; SOURCE GAS PRESSURE; TITANIUM DISILICIDE; ULTRAHIGH VACUUM;

TITANIUM COMPOUNDS;

EID: 0030146311     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836708     Document Type: Article

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