Several aspects of the return flows formation in horizontal CVD reactors

International Journal of Heat and Mass Transfer

Volumn 41, Issue 16, 1998, Pages 2529-2536

  Makhviladze, T M ^a   Martjushenko, A V ^a  

^a MOSCOW INSTITUTE OF PHYSICS AND TECHNOLOGY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; REYNOLDS NUMBER;

RETURN FLOW FORMATION;

VORTEX FLOW;

REACTOR; RETURN FLOW; VORTEX;

EID: 0032145992     PISSN: 00179310     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0017-9310(97)00188-9     Document Type: Article

References (6)

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2. 2. Visser, E. P., Kleijn, C. R., Govers, C. A., Hoogendoorn, C. J. and Giling, L. J., Journal of Crystal Growth, 1989, 94, 929.
3. 3. Kleijn, Chris, Transport Phenomena in Chemical Vapor Deposition Reactors, Voorburg, Netherlands, 1991.
4. 4. Giling, L. J., Electrochemistry Society Journal, 1982, 129, 634.
5. 5. Palm, E., Nonlinear Thermal Convection, Annual Review of Fluid Mechanics, 1975. 7, 39.
6. 6. Jensen, K. F., Einset, E. O. and Fotiadis, D. I., Annual Review of Fluid Mechanics, 1991, 23, 197.