Three-dimensional equipment modeling for chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 1147-1151

  Werner, Christoph ^a   Ilg, Matthias ^b   Uram, Kevin ^c  

^a SIEMENS AG   (Germany)

^b IBM   (United States)

^c LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342448165     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580285     Document Type: Article

References (17)

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