High power extreme ultra-violet (EUV) light sources for future lithography

Plasma Sources Science and Technology

Volumn 15, Issue 2, 2006, Pages

  Jonkers, Jeroen ^a  

^a PHILIPS RESEARCH LABORATORIES   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMMERCE; GAS DISCHARGE TUBES; LASERS; LIGHT SOURCES; LITHOGRAPHY; PLASMAS; SEMICONDUCTOR MATERIALS;

COMMERCIALIZATION; EXTREME ULTRA-VIOLET (EUV); OUTPUT POWER; POTENTIAL SHOWSTOPPERS;

ULTRAVIOLET RADIATION;

EID: 33646373415     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/15/2/S02     Document Type: Conference Paper

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