Protection of collector optics in an LPP based EUV source

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 910-918

  Rettig, C L ^a   Khodykin, O V ^a   Hoffman, J R ^a   Marx, W F ^a   Bowering, N R ^a   Vargas, E ^a   Ershov, A I ^a   Fomenkov, I V ^a   Partlo, W N ^a  

^a CYMER INC   (United States)

Author keywords

Collector; EUV; Ion Bombardment; Lithium; Mirror Lifetime; Multilayer Mirror; Optics Damage; Tin; Xenon

Indexed keywords

COLLECTOR; EUV; MIRROR LIFETIME; MULTILAYER MIRROR; OPTICS DAMAGE;

ION BOMBARDMENT; LITHIUM; MIRRORS; TIN; ULTRAVIOLET RADIATION; XENON;

LASER PRODUCED PLASMAS;

EID: 24644513832     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601517     Document Type: Conference Paper

References (4)

1. B. Hansson, et al, these proceedings.
2. P.P. Naulleau, et al, Proceedings of SPIE, 5037, 36 (2003).
3. V. V. Kondratenko et al., Appl. Opt. 32, 1811-1816 (1993).
4. S. Yulin, N. Benoit, T. Feigl, N. Kaiser, these proceedings (2005).