Power scale-up of the extreme ultraviolet electric capillary discharge source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 1, 2002, Pages 110-121

  Fornaciari, Neal R ^a   Bender, Howard ^a   Buchenauer, Dean ^a   Dimkoff, Jason ^d   Kanouff, Michael ^a   Karim, Steve ^a   Romeo, Carmelo ^c   Shimkaveg, Greg ^b   Silfvast, William T ^b   Stewart, Kenneth D ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b UNIVERSITY OF CENTRAL FLORIDA   (United States)

^c SEMATECH   (United States)

^d UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Capillary discharge source; EUV source; EUVL; Plasma discharge source

Indexed keywords

BANDWIDTH; ELECTRIC POWER GENERATION; LIGHT REFLECTION; MIRRORS; PHOTOLITHOGRAPHY;

PLASMA DISCHARGE SOURCE;

ULTRAVIOLET RADIATION;

EID: 0942302788     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472282     Document Type: Article

References (9)

1. V. Banine, R. Moors, "Extreme Ultraviolet Sources for Lithography Applications, " Proceedings of SPIE, Elizabeth A. Dobisz, 4343, pp 203-214, 2001.
2. W. T. Silfvast, M. Klosner, G. Shimkaveg, H. Bender, G. Kubiak, and N. Fornaciari, "High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography, " Proceedings of SPIE, Yuli Vladimirsky, 3676, pp. 272-275, 1999.
3. M. A. Klosner, and W. T. Silfvast, "Intense xenon capillary discharge extreme ultraviolet source in the 10-16 nm wavelength region, " Opt. Lett. 23, pp. 1609-1611, 1998.
4. Neal R. Fornaciari, J. J. Chang, Daniel R. Folk, Steve Gianoulakis, John E. M. Goldsmith, Glenn D. Kubiak, Bruce C. Long, Donna J. O'Connell, Greg Shimkaveg, William T. Silfvast, and Kenneth D. Stewart, "Development of an Electric Capillary Discharge Source, " Proceedings of SPIE, Elizabeth A. Dobisz, 3997, pp. 120-125, 2000.
5. Neal R. Fornaciari, Howard Bender, Dean Buchenauer, Mike Kanouff, Steve Karim, Glenn D. Kubiak, Chris Moen, Greg Shimkaveg, William T. Silfvast, and Kenneth D. Stewart, "Development of a High Average Power Extreme Ultraviolet Electric Capillary Discharge Source, " Proceedings of SPIE, Elizabeth A. Dobisz, 4343, pp 226-231, 2001.
6. "Thermal Analysis of High Repetition Rate Lamps for the EUV Electric Capillary Discharge Source, " Chris Moen, Neal Fornaciari, and Dean Buchenauer, Report to International SEMATECH, LITH114, June, 2001.
7. "Mechanically ruled aberration-corrected concave gratings for a flat-field grazing-incidence spectrograph, " Toshiaki Kita, Tatsuo Harada, N. Nakano, and H. Kuroda, Applied Optics, Vol. 22, No. 4, pp 512-513.
8. "A Source for EUV Lithography, " Jos Benschop, Rick Gontin, Vadim Banine, Noreen Harned, EUV Lithography Source Workshop, Matsue Japan, October, 2001.
9. nd International Workshop on EUV Lithography, Sun Francisco, Ca, October, 2000.