Multilayer coatings for the EUVL Process Development Tool

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 1170-1177

  Louis, E ^a   Zoethout, E ^a   Van De Kruijs, R W E ^a   Nedelcu, I ^a   Yakshin, A E ^a   Van Der Westen, S Alonso ^a   Tsarfati, T ^a   Bijkerk, F ^a   Enkisch, H ^b   Mullender S ^b  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

EUV Lithography; Mo Si multilayers

Indexed keywords

ERROR ANALYSIS; ION BEAMS; LITHOGRAPHY; MULTILAYERS; OPTICAL PROPERTIES; ULTRAVIOLET RADIATION;

E-BEAM EVAPORATION; EUV LITHOGRAPHY; MO/SI MULTILAYERS; PROJECTION OPTICS;

COATINGS;

EID: 24644456414     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.619856     Document Type: Conference Paper

References (8)

1. st International Sematech EUVL Symposium (www.sematech.org), Dallas, USA, 2002
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8. E. Zoethout et al., Proc. SPIE 5037, Santa Clara, USA, 2003, p 872-878