Laser-generated water plasma source for extreme-ultraviolet lithography and at-wavelength interferometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4146, Issue , 2000, Pages 101-112

  Constantinescu, Raluca C ^a   Jonkers, Jeroen ^a   Hegeman, Petra ^a   Visser, Matthieu ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE ANALYSIS; IMAGE QUALITY; INTERFEROMETERS; INTERFEROMETRY; PHOTOLITHOGRAPHY; PLASMA SOURCES; TARGETS;

EXTREME-ULTRAVIOLET LITHOGRAPHY; LASER-GENERATED WATER PLASMA SOURCE;

LASER PRODUCED PLASMAS;

EID: 0034505216     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.406661     Document Type: Conference Paper

References (9)