Integrating Philips' extreme UV source in the alpha-tools

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 260-271

  Pankert, Joseph ^a   Apetz, Rolf ^a   Bergmann, Klaus ^b   Derra, Günther ^a   Janssen, Maurice ^a   Jonkers, Jeroen ^a   Klein, Jürgen ^b   Krücken, Thomas ^a   List, Andreas ^a   Loeken, Michael ^a   Metzmacher, Christof ^a   Neff, Willi ^b   Probst, Sven ^b   Prümmer, Ralph ^b   Rosier, Oliver ^b   Seiwert, Stefan ^b   Siemons, Guido ^a   Vaudrevange, Dominik ^a   Wagemann, Dirk ^a   Weber, Achim ^a   Zink, Peter ^a   Zitzen, Oliver ^a   more..

^a PHILIPS RESEARCH LABORATORIES   (Germany)

^b FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

Author keywords

EUV Lithography; EUV source; Gas discharge plasma; Halogen cycle

Indexed keywords

DOSIMETRY; ELECTRODES; HALOGEN COMPOUNDS; INCANDESCENT LAMPS; LASER BEAMS; PROBLEM SOLVING; TIN; VACUUM; XENON;

EUV LITHOGRAPHY; EUV SOURCE; GAS DISCHARGE PLASMA; HALOGEN CYCLE;

ULTRAVIOLET RADIATION;

EID: 24644496630     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.598650     Document Type: Conference Paper

References (9)

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4. J. Pankert et al., "Update of Philips' EUV source", first EUV lithography conference, Dallas, Texas (2002)
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