Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma

Applied Optics

Volumn 38, Issue 25, 1999, Pages 5413-5417

  Bergmann, Klaus ^a   Schriever, Guido ^a   Rosier, Oliver ^a   Müller, Martin ^a   Neff, Willi ^b   Lebert, Rainer ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRODES; EMISSION SPECTROSCOPY; PINCH EFFECT; PLASMA DENSITY; PLASMA HEATING; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET RADIATION (EUV);

PLASMA SOURCES;

EID: 0032614398     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.38.005413     Document Type: Article

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