Rates and mechanisms of optic contamination in the EUV engineering test stand

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 418-428

  Grunow, P A ^a   Klebanoff, L E ^a   Graham Jr , S ^a   Haney, S J ^a   Clift, W M ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Contamination; Erosion; ETS; EUV; Lithography; Optics; Oxidation

Indexed keywords

CARBONIZATION; CONTAMINATION; DEGASSING; EROSION; MOLYBDENUM; OPTICAL MULTILAYERS; OPTICAL RESOLVING POWER; OPTICS; OXIDATION; REFLECTION; SILICON; ULTRAVIOLET RADIATION;

CARBONIZING; MULTILAYER COATED OPTICS; OPTIC CONTAMINATION; PLASMA INDUCED MULTILAYER EROSION; PLASMA INDUCED OUTGASSING; SPRAY JET INDUCED EROSION;

LITHOGRAPHY;

EID: 0141724700     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.499359     Document Type: Conference Paper

References (4)

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4. L.E. Klebanoff, M.E Malinowski, P. Grunow, W.M. Clift, C. Steinhaus, A.H. Leung, S.J. Haney, "First Environmental Data from the EUV Engineering Test Stand," Emerging Lithographic Technologies V, E. A. Dobisz, Ed., Proc. of SPIE vol. 4343, 342 (2001).