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Volumn 184, Issue 1, 2000, Pages 161-167

Strong extreme ultraviolet emission from a double-stream xenon/helium gas puff target irradiated with a Nd:YAG laser

Author keywords

[No Author keywords available]

Indexed keywords

HELIUM; LASER PRODUCED PLASMAS; NEODYMIUM LASERS; ULTRAVIOLET RADIATION; XENON;

EID: 0034298740     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-4018(00)00946-9     Document Type: Article
Times cited : (104)

References (24)
  • 11
    • 0029488708 scopus 로고
    • Applications of Laser Plasma Radiation II
    • in: M.C. Richardson, G.A. Kyrala (Eds.), SPIE Press, Bellingham
    • H.M. Hertz, L. Rymell, M. Berglund, L. Malmqvist, in: M.C. Richardson, G.A. Kyrala (Eds.), Applications of Laser Plasma Radiation II, Proc. SPIE Vol. 2523, SPIE Press, Bellingham, 1995, p. 88.
    • (1995) Proc. SPIE , vol.2523 , pp. 88
    • Hertz, H.M.1    Rymell, L.2    Berglund, M.3    Malmqvist, L.4
  • 15
    • 0030314823 scopus 로고    scopus 로고
    • Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI
    • in: D.E. Seeger (Ed.), SPIE Press, Bellingham
    • H. Fiedorowicz, A. Bartnik, J. Kostecki, M. Szczurek, in: D.E. Seeger (Ed.), Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, Proc. SPIE Vol. 2723, SPIE Press, Bellingham, 1996, p. 310.
    • (1996) Proc. SPIE , vol.2723 , pp. 310
    • Fiedorowicz, H.1    Bartnik, A.2    Kostecki, J.3    Szczurek, M.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.