Status of Philips' extreme UV source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 1, 2004, Pages 152-159

  Pankert, Joseph ^a   Bergmann, Klaus ^b   Klein, Jürgen ^b   Neff, Willi ^b   Rosier, Oliver ^b   Seiwert, Stefan ^b   Smith, Christopher ^b   Probst, Sven ^b   Vaudrevange, Dominik ^a   Siemons, Guido ^a   Apetz, Rolf ^a   Jonkers, Jeroen ^a   Locken, Michael ^a   Derra, Günther ^a   Krücken, Thomas ^a   Zink, Peter ^a  

^a PHILIPS RESEARCH LABORATORIES   (Germany)

^b FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

Author keywords

EUV Lithography; EUV source; Gas discharge plasma

Indexed keywords

ATOMIC PHYSICS; CATHODES; ELECTRODES; IGNITION; INTEGRATION; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; EXTREME ULTRAVIOLET (EUV) SOURCE; GAS DISCHARGE PLASMA; HOLLOW CATHODE TRIGGERED (HCT);

LITHOGRAPHY;

EID: 3843139365     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.538041     Document Type: Conference Paper

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