EUV (13.5 nm) light generation using a dense plasma focus device

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue II, 1999, Pages 846-858

  Partlo, William ^a   Fomenkov, Igor ^a   Birx, Daniel ^a  

^a CYMER INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC ENERGY STORAGE; FOCUSING; LIGHT EMISSION; LIGHT REFLECTION; LITHIUM; PLASMA DENSITY; ULTRAVIOLET RADIATION;

DENSE PLASMA FOCUS (DPF) DEVICES; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL);

PHOTOLITHOGRAPHY;

EID: 0032647912     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351080     Document Type: Conference Paper

References (16)