Collection efficiency of EUV sources

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 728-741

  Derra, Guenther ^a   Singer, Wolfgang ^b  

^a PHILIPS RESEARCH LABORATORIES   (Germany)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

Collection efficiency; Etendue; EUV lithography; EUV source; HCT pinch source; Source size

Indexed keywords

ALGORITHMS; CHARGE COUPLED DEVICES; OPTICAL FLOWS; OPTIMIZATION; PLASMA SOURCES; PROJECTION SYSTEMS; RADIATION; RAY TRACING;

COLLECTION EFFICIENCY; PINHOLE IMAGES;

LITHOGRAPHY;

EID: 0141612960     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482641     Document Type: Conference Paper

References (9)

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