High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue I, 1999, Pages 272-275

  Silfvast, W T ^a   Klosner, M ^a   Shimkaveg, G ^a   Bender, H ^a   Kubiak, G ^a   Fornaciari, N ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; ELECTRIC DISCHARGES; ELECTRODES; OPTICS; PLASMA SOURCES; ULTRAVIOLET RADIATION; XENON;

CAPILLARY DISCHARGE SOURCES; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); PLASMA DISCHARGE SOURCES;

PHOTOLITHOGRAPHY;

EID: 0032663961     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351098     Document Type: Conference Paper

References (3)