Time-resolved pinhole camera imaging and extreme ultraviolet spectrometry on a hollow cathode discharge in xenon

Physical Review E - Statistical, Nonlinear, and Soft Matter Physics

Volumn 68, Issue 5 2, 2003, Pages 564031-5640310

  Kieft, E R ^a   Van der Mullen, J J A M ^a   Kroesen, G M W ^a   Banine, V ^b  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CAMERAS; CAPACITANCE; ELECTRIC POTENTIAL; ELECTROCHEMICAL ELECTRODES; IONIZATION; PLASMA APPLICATIONS; SPECTRUM ANALYSIS; THERMAL EFFECTS; ULTRAVIOLET SPECTROMETERS; ULTRAVIOLET SPECTROSCOPY; XENON;

CATHODE DISCHARGE PLASMA SOURCES; PINHOLE CAMERAS; TIME-RESOLVED PINHOLE IMAGING;

IMAGING TECHNIQUES;

EID: 0942289320     PISSN: 1063651X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (16)

1. V. Banine and J. Moors, Proc. SPIE 4343, 203 (2001).
2. V. Banine, O. Frijns, R. Moors, R. Gontin, H. Franken, K. Koshelev, E. Rieft, K. Garloff, and Yu. Sidelnikov, Proceedings of the first International EUVL Symposium, International SEMATECH, Dallas, Texas, 2002 (unpublished).
3. K. Bergmann, O. Rosier, R. Lebert, W. Neff, and R. Poprawe, Microelectron. Eng. 57-58, 71 (2001).
4. K. Bergmann, O. Rosier, W. Neff, and R. Lebert, Appl. Opt. 39, 3833 (2000).
5. K. Bergmann, G. Schriever, O. Rosier, M. Müller, W. Neff, and R. Lebert, Appl. Opt. 38, 5413 (1999).
6. R.D. Cowan, The Theory of Atomic Structure and Spectra (University of California Press, Berkeley, 1981) (code in a version for personal computers, edited by A. Kramida, at http://das101.isan.troitsk.ru/cowan.htm).
7. For product information see http://www.schulz-si.com.
8. C. Martin and S. Bowyer, Appl. Opt. 21, 4206 (1982).
9. S.S. Churilov and Y.N. Joshi, Phys. Scr. 65, 40 (2002).
10. V. Kaufman and J. Sugar, J. Opt. Soc. Am. B 1, 38 (1984).
11. M.A. Klosner and W.T. Silfvast, J. Opt. Soc. Am. B 17, 1279 (2000).
12. W. Benker, J. Christiansen, K. Frank, H. Gundel, W. Hartmann, T. Redel, and M. Stetter, IEEE Trans. Plasma Sci. 17, 754 (1989).
13. J.-P. Boeuf and L.C. Pitchford, IEEE Trans. Plasma Sci. 19, 286 (1991).
14. R. Stuik, H. Fledderus, P. Hegeman, J. Jonkers, M. Visser, V. Banine, and F. Bijkerk, in Proceedings of the Second SEMATECH Workshop on Extreme UV Lithography, San Francisco, 2002 (unpublished).
15. B.C. Fawcett, A. Ridgeley, and G.E. Bromage, Phys. Scr. 18, 315 (1978).
16. CRC Handbook of Chemistry and Physics, 72 ed., edited by D. R. Lide (CRC Press, Boca Raton, FL, 1991).