Frequency scaling in a hollow-cathode-triggered pinch plasma as radiation source in the extreme ultraviolet

IEEE Transactions on Plasma Science

Volumn 32, Issue 1 II, 2004, Pages 240-246

  Rosier, Oliver ^a   Apetz, Rolf ^b   Bergmann, Klaus ^c   Jonkers, Jeroen ^b   Wester, Rolf ^c   Neff, Willi ^c   Pankert, Joseph ^b  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b PHILIPS RESEARCH LABORATORIES   (Germany)

^c FRAUNHOFER GESELLSCHAFT   (Germany)

Author keywords

Extreme ultraviolet (EUV); Extreme ultraviolet lithography (EUV L); Pinch plasma; Plasma recovery; Pseudospark discharge

Indexed keywords

CARRIER CONCENTRATION; CHARGE CARRIERS; COMPUTER SIMULATION; CURRENT DENSITY; ELECTRIC DISCHARGES; ELECTRIC SPARKS; ELECTRODES; ENERGY GAP; MONTE CARLO METHODS; PHOTOLITHOGRAPHY; PINCH EFFECT; RADIATION EFFECTS;

EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET LITHOGRAPHY; FREQUENCY SCALING; HOLLOW CATHODE TRIGGERED PINCH PLASMA; PASCHEN CURVE; PLASMA RECOVERY; PSEUDOSPARK DISCHARGES;

PLASMAS;

EID: 2442459679     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2004.823988     Document Type: Article

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