Laser-produced-plasma light source for EUV lithography

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 822-828

  Soumagne, Georg ^a   Abe, Tamotsu ^a   Suganuma, Takashi ^a   Imai, Yousuke ^a   Someya, Hiroshi ^a   Hoshino, Hideo ^a   Nakano, Masaki ^a   Komori, Hiroshi ^a   Takabayashi, Yuichi ^a   Ariga, Tatsuya ^a   Ueno, Yoshifumi ^a   Wada, Yasunori ^a   Endo, Akira ^a   Toyoda, Koichi ^a  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

Author keywords

EUV lithography; Laser produced plasma; Magnetic mitigation; RF CO2 laser; Xenon droplet

Indexed keywords

BANDWIDTH; LASER PRODUCED PLASMAS; LIGHT SOURCES; OSCILLATORS (ELECTRONIC); POWER AMPLIFIERS; ULTRAVIOLET RADIATION;

EUV LITHOGRAPHY; MAGNETIC MITIGATION; RF-CO2 LASER; XENON DROPLET;

LITHOGRAPHY;

EID: 24644488222     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599333     Document Type: Conference Paper

References (6)

1. Source requirements, ASML/Canon/Nikon, EUV Source Workshop, Antwerp, Belgium, September 2003.
2. T. Abe et al., "Performance of a 10kHz laser-produced-plasma light source for EUV lithography", Proc. SPIE, vol. 5374, pp. 160-167, 2004.
3. R. Stuik, et al., "Portable diagnostics for EUV light sources", Proc. SPIE, vol. 4146, pp.121-127, 2000.
4. U. Stamm, et al., "High Power EUV Lithography Sources Based on Gas Discharges and Laser Produced Plasmas", Proc. SPIE, vol. 5037, pp. 119-129, 2003.
5. M. Nakano et al., "High average power EUV light source for the next generation lithography by laser produced xenon plasma", Proc. SPIE, vol. 5537, pp. 1-10, 2004.
6. H. Komori et al., "Ion damage analysis on EUV collector mirrors", Proc. SPIE, vol. 5374, pp. 839-846, 2004.