Liquid-xenon-jet laser-plasma X-ray and EUV source

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 667-670

  Hansson, B A M ^a   Rymell, L ^a   Berglund, M ^a   Hertz, H M ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE COUPLED DEVICES; CRYOGENIC LIQUIDS; LASER PRODUCED PLASMAS; MICROSCOPIC EXAMINATION; MONOLITHIC MICROWAVE INTEGRATED CIRCUITS; NEODYMIUM LASERS; SURFACES; X RAY LITHOGRAPHY; XENON;

EXTREME ULTRAVIOLET PROJECTION LITHOGRAPHY; FREE STANDING TRANSMISSION GRATING; LIQUID XENON JET LASER PLASMA X RAY; MICROSCOPIC LIQUID DROPLETS; MICROSCOPIC LIQUID JET TARGET METHOD; PLASMA DISCHARGE; PROXIMITY X RAY LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0034207224     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00401-9     Document Type: Article

References (22)

1. 1. J. P. Benschop, W. M. Kaiser and D. C. OckWell. Y. Vladimirsky (ed.), Emerging lithographic technologies III. vol. 3676 of ProceedIngs of SPIE, (1999) 246.
2. 2. S. Okazaki. Y. Vladimirsky (ed.), Emerging lithographic technologies III. vol. 3676 of Proceedings of SPIE, (1999) 238.
3. 3. J. E. Goldsmith et al. Y. Vladimirsky (ed.), Emerging lithographic technologies III. vol. 3676 of Proceedings of SPIE, (1999) 264.
4. 4. R. Selzer and J. Heaton. Using X-ray LithogRaphy to Make Sub 100 nm MMICs. In this proceeding.
5. 5. V. Y. Banine, J. P. H. Benschop and H. G. C. Werij. Comparison of Extreme Ultraviolet Sources for Lithography Applications. In this proceeding.
6. 6. R. Bobkowski and R. Fedosejevs. J. Vac. Sci. Technol. B, 14 (1996), 1973.
7. 7. L. Rymell and H. M. Hertz. Rev. Sci. Inst., 66 (1995), 4916. And references therein.
8. 8. H. Fiedorowicz, A. Bartnik, P. Parys and Z. Patron. P. B. Kenway (ed.), X-ray optics and microanalysis 1992. Institute of Physics, Bristol, No. 130 in Institute of Physics ConferEnce Series, (1993) 515.
9. 9. G. D. Kubiak, L. J. Bernardez, K. D. Krenz, D. J. O'Connell, R. Gutowski and A. M. M. Todd. G. D. Kubiak and D. R. Kania (eds.), Extreme ultraviolet lithography. vol. 4 of OSA Trends in Optics and Photonics, (1996) 66.
10. 10. L. Rymell and H. M. Hertz. Opt. Commun., 103 (1993), 105.
11. 11. L. Malmqvist, L. Rymell, M. Berglund and H. M. Hertz. Rev. Sci. Inst., 67 (1996), 4150.
12. 12. T. Mochizuki and C. Yamanaka. Soft X-ray optics and technology (1986). vol. 733 of Proceedings of SPIE, (1987) 23.
13. 13. M. Tanimoto. Proceedings of the 7th Symposium on Fusion Technology, Grenoble. (1972) 267.
14. 14. M. Berglund, L. Rymell, H. M. Hertz and T. Wilhein. Rev. Sci. Inst., 69 (1998), 2361.
15. 15. L. Rymell, M. Berglund, B. A. M. HansSon and H. M. Hertz. Y. Vladimirsky (ed.), Emerging lithographic technologies III. vol. 3676 of Proceedings of SPIE, (1999) 421.
16. 16. T. Mochizuki et al. Phys. Rev. A, 33 (1986), 525.
17. 17. G. D. Kubiak, K. D. Krenz, K. W. Berger, T. G. Trucano, P. W. Fisher and M. J. Gouge. F. Zernike and D. T. Attwood (eds.), Extreme ultraviolet lithography. vol. 21 of OSA Proceedings, (1995) 248.
18. 18. H. Fiedorowicz et al. Emerging lithographic technologies III. vol. 2523 of Proceedings of SPIE, (1995) 60.
19. 19. G. D. Kubiak, L. Bernardez, K. Krenz and W. C. Sweatt. Y. Vladimirsky (ed.), Emerging lithographic technologies III. vol. 3676 of Proceedings of SPIE, (1999) 669.
20. 20. T. Wilhein, S. Rehbein, D. Hambach, M. Berglund, L. Rymell and H. M. Hertz. Rev. Sci. Inst., 70 (1999), 1694.
21. 21. J. F. Wyart, C. Bauche-Arnoult and E. Luc-Koenig. Phys. Scripta, 32 (1985), 103.
22. 22. C. Breton et al. Phys. Scripta, 37 (1988), 33.