Characterization of a liquid-xenon-jet laser-plasma extreme-ultraviolet source

Review of Scientific Instruments

Volumn 75, Issue 6, 2004, Pages 2122-2129

  Hansson, B A M ^a   Hemberg, O ^a   Hertz, H M ^a   Berglund, M ^a,b   Choi, H J ^a   Jacobsson, B ^a   Janin, E ^a   Mosesson, S ^a   Rymell, L ^a   Thoresen, J ^a   Wilner, M ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b LUND UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; CHARGE COUPLED DEVICES; ELECTRIC DISCHARGES; LITHOGRAPHY; SPUTTERING; ULTRAVIOLET RADIATION; XENON;

CONVERSION EFFICIENCY; DEEP-ULTRAVIOLET (DUV); FARADAY-CUP DETECTORS;

LASER PRODUCED PLASMAS;

EID: 3042857438     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1755441     Document Type: Article

References (35)

1. L. Rymell, M. Berglund, B. A. M. Hansson, and H. M. Hertz, Proc. SPIE 3676, 421 (1999).
2. B. A. M. Hansson, L. Rymell, M. Berglund, and H. M. Hertz, Microelectron. Eng. 53, 667 (2000).
3. J. E. Bjorkholm, Intel Tech. J. Q3, 1 (1998).
4. Next Generation Lithography (NGL) Workshop, Pasadena, California, available at www.sematech.org (2001).
5. K. Kemp, in 1st International EUV Lithography Symposium, Dallas, Texas (2002), available at www.sematech.org.
6. EUVL Source Workshop, Santa Clara, CA, 2 (2003), available at www.sematech.org.
7. D. A. Tichenor et al., Opt. Lett. 16, 1557 (1991).
8. L. Malmqvist, A. L. Bogdanov, L. Montelius, and H. Hertz, J. Vac. Sci. Technol. B 15, 814 (1997).
9. C. J. Gaeta et al., Proc. SPIE 4688, 818 (2002).
10. M. Berglund, L. Rymell, M. Peuker, T. Wilhein, and H. M. Hertz, J. Microsc. 197, 268 (2000).
11. H. Kondo, T. Tomie, and H. Shimizu, Appl. Phys. Lett. 69, 182 (1996).
12. H. M. Hertz, L. Malmqvist, L. Rymell, and M. Berglund, Method and Apparatus for Generating X-Ray or EUV Radiation (1999), U.S. Patent No. 6,002,744.
13. L. Malmqvist, L. Rymell, M. Bergiund, and H. M. Hertz, Rev. Sci. Instrum. 67, 4150 (1996).
14. T. Mochizuki and C. Yamanaka, Proc. SPIE 733, 23 (1987).
15. H. Franken, Y. Watanabe, and K. Ota, presented at EUVL Source Workshop in Antwerpen, Belgium, 2003, www.sematech.org.
16. R. Stuik, R. C. Constantinescu, P. Hegeman, J. Jonkers, H. F. Fledderus, V. Banine, and F. Bijkerk, Proc. SPIE 4146, 121 (2000).
17. B. A. M. Hansson, L. Rymell, M. Berglund, O. Hemberg, E. Janin, J. Thoresen, and H. M. Hertz, Proc. SPIE 4506, 1 (2001).
18. N. Koster tt al., Microelectron. Eng. 61-62, 65 (2002), and references therein.
19. J. Benschop, R. Gontin, V. Banine, and N. Harned, in EUV Lithography Source Workshop, Matsue, Japan (2001), available at www.sematech.org.
20. TRW/Cutting Edge Optronics Laser-Produced Plasma EUV Source Program, EUV Source Workshop. Dallas, Texas (2002), available at www.sematech.org.
21. G. H. Derra and W. Singer, Proc. SPIE 5037, 728 (2003).
22. B. A. M. Hansson, S. Mosesson, and H. M. Hertz (unpublished).
23. M. Antoni, W. Singer, J. Schultz, J. Wangler, I. Escudero-Sanz, and B. Kruizinga, Proc. SPIE 4146, 25 (2000).
24. I. V. Fomenkov, R. M. Ness, I. R. Oliver, S. T. Melnychuk, O. V. Khodykin, N. R. Bowering, C. L. Rettig, and J. R. Hoffman, Proc. SPIE 5037, 807 (2003).
25. R. Fruke, T. Wilhein, M. Wieland, and U. Vogt, J. Phys. IV 104, 153 (2003).
26. V. Banine, J. P. Benschop, M. Leenders, and R. Moors, Proc. SPIE 3997, 126 (2000).
27. B. A. M. Hansson, R. Lars, M. Berglund, O. E. Hemberg, E. Janin, J. Thoresen, S. Mosesson, J. Wallin, and H. M. Hertz, Proc. SPIE 4688, 102 (2002).
28. J. F. Ziegler, SRIM 2000, software available at www.srim.org.
29. J. D. Gillaspy, L. Ratliff, J. Pomeroy, and S. Bajt, Study of EUV Source Collector Damage Mechanism (2003), CD-ROM proceedings from 2nd Intenational EUVL Symposium in Antwerpen, Belgium, available from www.semateeh.org.
30. H. Daido, S. Yamagami, M. Suzuki, H. Azuma, I. W. Choi, and H. Fiedorowicz, Appl. Phys. B: Lasers Opt. 71, 385 (2001).
31. A. Endo, presented at EUVL Source Workshop in Antwerpen, Belgium, 2003. Available at www.sematech.org.
32. M. L. Ginter and T. J. McIlrath, Appl. Opt. 27, 885 (1988).
33. L. Shmaenok et al., Microelectron. Eng. 23, 211 (1994).
34. K. Takenoshita, C.-S. Koay, M. C. Richardson, and I. C. E. Turcu, Proc. SPIE 5037, 792 (2003).
35. G. Niimi, Y. Ueno, K. Nishigori, T. Aota, H. Yashiro, and T. Tomie, Proc. SPIE 5037, 370 (2003).