-
1
-
-
33747592432
-
-
Yokohama, 1994.
-
T. Abe, S. Nakazawa, N. Koshikawa, Y. Sakawa, and T. Shoji, "Structure of energetic electrons in helicon plasma by using 2D emission intensity measurements," in Proc. 2nd Int. Conf. Reactive Plasmas, Yokohama, 1994.
-
S. Nakazawa, N. Koshikawa, Y. Sakawa, and T. Shoji, "Structure of Energetic Electrons in Helicon Plasma by Using 2D Emission Intensity Measurements," in Proc. 2nd Int. Conf. Reactive Plasmas
-
-
Abe, T.1
-
2
-
-
33747589291
-
-
p. 1771, 1995
-
D.D. Blackwell and F.F. Chen, "Probe detection of phased beams," Bull. Amer. Phys. Soc., vol. 40, p. 1771, 1995
-
And F.F. Chen, "Probe Detection of Phased Beams," Bull. Amer. Phys. Soc., Vol. 40
-
-
Blackwell, D.D.1
-
6
-
-
11744347315
-
-
p. 1130, 1987.
-
R.W. Boswell and R.K. Porteus, "Large volume, high density rf inductively coupled plasma," Appl. Phys. Lett., vol. 50, p. 1130, 1987.
-
And R.K. Porteus, "Large Volume, High Density Rf Inductively Coupled Plasma," Appl. Phys. Lett., Vol. 50
-
-
Boswell, R.W.1
-
8
-
-
0013383818
-
-
p. 163, 1982.
-
R.W. Boswell, R.K. Porteus, A. Prytz, A. Bouchoule, and P. Ranson, "Some features of rf excited fully ionized low pressure argon plasma," Phys. Lett. A, vol. 91, p. 163, 1982.
-
R.K. Porteus, A. Prytz, A. Bouchoule, and P. Ranson, "Some Features of Rf Excited Fully Ionized Low Pressure Argon Plasma," Phys. Lett. A, Vol. 91
-
-
Boswell, R.W.1
-
11
-
-
0043266059
-
-
p. 635, 1992.
-
F.F. Chen and C.D. Decker, "Electron acceleration in helicon sources," Plasma Phys. Control Fusion, vol. 34, p. 635, 1992.
-
And C.D. Decker, "Electron Acceleration in Helicon Sources," Plasma Phys. Control Fusion, Vol. 34
-
-
Chen, F.F.1
-
12
-
-
84957342724
-
-
p. 1389, 1992.
-
F.F. Chen and G. Chevalier, "Experiments on helicon plasma sources," J. Vac. Sci. Technol. A, vol. 10, p. 1389, 1992.
-
And G. Chevalier, "Experiments on Helicon Plasma Sources," J. Vac. Sci. Technol. A, Vol. 10
-
-
Chen, F.F.1
-
13
-
-
33747592662
-
-
p. 1701.
-
"RF production of long, dense plasma columns," in Int. Conf. Plasma Physics III, Inst. Ion Physics, Univ. Innsbruck, A-6020 Inns-bruck, Austria, 1992, p. 1701.
-
Production of Long, Dense Plasma Columns," in Int. Conf. Plasma Physics III, Inst. Ion Physics, Univ. Innsbruck, A-6020 Inns-bruck, Austria, 1992
-
-
-
15
-
-
0031142981
-
-
A411, 1997.
-
F.F. Chen, X. Jiang, J.D. Evans, G. Tynan, and D. Arnush, "Low field helicon discharges," Plasma Phys. Control Fusion, vol. 39, p. A411, 1997.
-
X. Jiang, J.D. Evans, G. Tynan, and D. Arnush, "Low Field Helicon Discharges," Plasma Phys. Control Fusion, Vol. 39, P.
-
-
Chen, F.F.1
-
16
-
-
0030134321
-
-
p. 173, 1995.
-
F.F. Chen, I.D. Sudit, and M. Light, "Downstream physics of the helicon discharge," Plasma Sources Sci. Technol., vol. 4, p. 173, 1995.
-
I.D. Sudit, and M. Light, "Downstream Physics of the Helicon Discharge," Plasma Sources Sci. Technol., Vol. 4
-
-
Chen, F.F.1
-
17
-
-
33747624035
-
-
p. 95.
-
F.F. Chen, I.D. Sudit, M. Light, D. D. Blackwell, and D. Arnush, "Equilibrium conditions in high-density helicon discharges," in Proc. Plasma Etch Users Group, NCCAVS, Sunnyvale, CA, 1995, p. 95.
-
I.D. Sudit, M. Light, D. D. Blackwell, and D. Arnush, "Equilibrium Conditions in High-density Helicon Discharges," in Proc. Plasma Etch Users Group, NCCAVS, Sunnyvale, CA, 1995
-
-
Chen, F.F.1
-
18
-
-
0029352490
-
-
p. 337, 1995.
-
R.T.S. Chen, R. A. Breun, S. Gross, N. Hershkowitz, M. J. Hsieh, and J. Jacobs, "Experimental studies of multimode helicon plasma waves," Plasma Sources Sci. Technol., vol. 4, p. 337, 1995.
-
R. A. Breun, S. Gross, N. Hershkowitz, M. J. Hsieh, and J. Jacobs, "Experimental Studies of Multimode Helicon Plasma Waves," Plasma Sources Sci. Technol., Vol. 4
-
-
Chen, R.T.S.1
-
19
-
-
21144470004
-
-
p. 1165, 1993.
-
G. Chevalier and F.F. Chen, "Experimental modeling of inductive discharges," J. Vac. Sci. Technol. A, vol. 11, p. 1165, 1993.
-
And F.F. Chen, "Experimental Modeling of Inductive Discharges," J. Vac. Sci. Technol. A, Vol. 11
-
-
Chevalier, G.1
-
20
-
-
49549159226
-
-
p. 239, 1974.
-
C. Christopoulos, R.W. Boswell, and P.J. Christiansen, "Measurements of spatial cyclotron damping in a uniform magnetic field," Phys. Lett. A, vol. 47, p. 239, 1974.
-
R.W. Boswell, and P.J. Christiansen, "Measurements of Spatial Cyclotron Damping in A Uniform Magnetic Field," Phys. Lett. A, Vol. 47
-
-
Christopoulos, C.1
-
21
-
-
0009968335
-
-
p. 2331, 1993.
-
C. Cui and R.W. Boswell, "Role of excitation frequency in a lowpressure, inductively coupled radio-frequency, magnetized plasma," Appl. Phys. Lett., vol. 63, p. 2331, 1993.
-
And R.W. Boswell, "Role of Excitation Frequency in A Lowpressure, Inductively Coupled Radio-frequency, Magnetized Plasma," Appl. Phys. Lett., Vol. 63
-
-
Cui, C.1
-
22
-
-
33747606864
-
-
p. 2102, 1990.
-
C.D. Decker and F.F. Chen, "High density ECR source at 30 MHz," Bull. Amer. Phys. Soc., vol. 35, p. 2102, 1990.
-
And F.F. Chen, "High Density ECR Source at 30 MHz," Bull. Amer. Phys. Soc., Vol. 35
-
-
Decker, C.D.1
-
23
-
-
0000788547
-
-
p. 2788, 1996.
-
A.W. Degeling, C.O. Jung, R. W. Boswell, and A. R. Ellingboe, "Plasma production from helicon waves," Phys. Plasmas, vol. 3, p. 2788, 1996.
-
C.O. Jung, R. W. Boswell, and A. R. Ellingboe, "Plasma Production from Helicon Waves," Phys. Plasmas, Vol. 3
-
-
Degeling, A.W.1
-
24
-
-
0001760372
-
-
p. 1807, 1995.
-
A.R. Ellingboe, R.W. Boswell, J. P. Booth, and N. Sadeghi, "Electron beam pulses produced by helicon-wave excitation," Phys. Plasmas, vol. 2, p. 1807, 1995.
-
R.W. Boswell, J. P. Booth, and N. Sadeghi, "Electron Beam Pulses Produced by Helicon-wave Excitation," Phys. Plasmas, Vol. 2
-
-
Ellingboe, A.R.1
-
25
-
-
33747594125
-
-
CA-5.
-
"Time and spatially resolved optical emission in a helicon re-actor," in Gaseous Electronics Conf., Montreal, Canada, 1993, Abstract CA-5.
-
And Spatially Resolved Optical Emission in A Helicon Re-actor," in Gaseous Electronics Conf., Montreal, Canada, 1993, Abstract
-
-
-
26
-
-
0000651925
-
-
p. 2797, 1996.
-
A.R. Ellingboe and R.W. Boswell, "Capacitive, inductive, and heliconwave modes of operation of a helicon plasma source," Phys. Plasmas, vol. 3, p. 2797, 1996.
-
And R.W. Boswell, "Capacitive, Inductive, and Heliconwave Modes of Operation of A Helicon Plasma Source," Phys. Plasmas, Vol. 3
-
-
Ellingboe, A.R.1
-
27
-
-
0008656859
-
-
p. 7188, 1993.
-
K.P. Giapis, N. Sadeghi, J. Margot, R.A. Gottscho, and T. C. J. Lee, "Limits to ion energy control in high density glow discharges: Measurement of absolute metastable ion concentrations," J. Appl. Phys., vol. 73, p. 7188, 1993.
-
N. Sadeghi, J. Margot, R.A. Gottscho, and T. C. J. Lee, "Limits to Ion Energy Control in High Density Glow Discharges: Measurement of Absolute Metastable Ion Concentrations," J. Appl. Phys., Vol. 73
-
-
Giapis, K.P.1
-
28
-
-
84967867020
-
-
p. 1322, 1994.
-
N. Jiwari, T. Fukasawa, H. Kawakami, H. Shindo, and Y. Horiike, "Helicon wave plasma reactor employing single-loop antenna," J. Vac. Sci. Technol. A, vol. 12, p. 1322, 1994.
-
T. Fukasawa, H. Kawakami, H. Shindo, and Y. Horiike, "Helicon Wave Plasma Reactor Employing Single-loop Antenna," J. Vac. Sci. Technol. A, Vol. 12
-
-
Jiwari, N.1
-
29
-
-
33747620960
-
-
p. 169.
-
K. Kadota and T. Shoji, "Efficient production of metastable rare gas atoms by recombining plasma of high density," in Proc. Int. Sem. Reactive Plasmas, Nagoya, Japan, 1991, p. 169.
-
And T. Shoji, "Efficient Production of Metastable Rare Gas Atoms by Recombining Plasma of High Density," in Proc. Int. Sem. Reactive Plasmas, Nagoya, Japan, 1991
-
-
Kadota, K.1
-
31
-
-
0009393629
-
-
p. 1368, 1994.
-
V.P. Katyukha, G.S. Kirichenko, A. V. Rusavskii, V. B. Taranov, and K. P. Shamrai, "Helicon ion source for plasma processing," Rev. Sci. Intrum., vol. 65, p. 1368, 1994.
-
G.S. Kirichenko, A. V. Rusavskii, V. B. Taranov, and K. P. Shamrai, "Helicon Ion Source for Plasma Processing," Rev. Sci. Intrum., Vol. 65
-
-
Katyukha, V.P.1
-
32
-
-
0031192535
-
-
p. 2741, 1997.
-
P.A. Keiter, E.E. Scime, and M. M. Baikey, "Frequency dependent effects in helicon plasmas," Phys. Plasmas, vol. 4, p. 2741, 1997.
-
E.E. Scime, and M. M. Baikey, "Frequency Dependent Effects in Helicon Plasmas," Phys. Plasmas, Vol. 4
-
-
Keiter, P.A.1
-
33
-
-
0000681854
-
-
p. 1462, 1996.
-
J.H. Kim and H.Y. Chang, "A study on ion energy distribution functions and plasma potentials in helicon wave plasmas," Phys. Plasmas, vol. 3, p. 1462, 1996.
-
And H.Y. Chang, "A Study on Ion Energy Distribution Functions and Plasma Potentials in Helicon Wave Plasmas," Phys. Plasmas, Vol. 3
-
-
Kim, J.H.1
-
34
-
-
0030418237
-
-
p. 1364, 1996.
-
J.H. Kirn, S.M. Yun, and H. Y. Chang, "m = ±1 and m = ±2 mode helicon wave excitation," IEEE Trans. Plasma Sci., vol. 24, p. 1364, 1996.
-
S.M. Yun, and H. Y. Chang, "M = ±1 and M = ±2 Mode Helicon Wave Excitation," IEEE Trans. Plasma Sci., Vol. 24
-
-
Kirn, J.H.1
-
36
-
-
0031513314
-
-
p. 307, 1997.
-
S.H. Kim, I.H. Kim, and K. S. Kim, "Characterization of helicon wave plasma for a thin film deposition process," J. Vac. Sci. Technol. A, vol. 15, p. 307, 1997.
-
I.H. Kim, and K. S. Kim, "Characterization of Helicon Wave Plasma for A Thin Film Deposition Process," J. Vac. Sci. Technol. A, Vol. 15
-
-
Kim, S.H.1
-
37
-
-
22244466913
-
-
p. 893, 1991.
-
A. Komori, T. Shoji, K. Miyamoto, J. Kawai, and Y. Kawai, "Helicon waves and efficient plasma production," Phys. Fluids B, vol. 3, p. 893, 1991.
-
T. Shoji, K. Miyamoto, J. Kawai, and Y. Kawai, "Helicon Waves and Efficient Plasma Production," Phys. Fluids B, Vol. 3
-
-
Komori, A.1
-
38
-
-
0000716438
-
-
p. 1463, 1997.
-
J.G. Kwak, H.D. Choi, H. I. Bak, S. Cho, J. G. Bak, and S. K. Kim, "Frequency dependence of the plasma density for helicon plasmas," Phys. Plasmas, vol. 4, p. 1463, 1997.
-
H.D. Choi, H. I. Bak, S. Cho, J. G. Bak, and S. K. Kim, "Frequency Dependence of the Plasma Density for Helicon Plasmas," Phys. Plasmas, Vol. 4
-
-
Kwak, J.G.1
-
39
-
-
0030205216
-
-
p. 383, 1996.
-
H.J. Lee, I.D. Yang, and K. W. Whang, "Effects of magnetic fields on a planar inductively coupled argon plasma," Plasma Sources Sci. Technol., vol. 5, p. 383, 1996.
-
I.D. Yang, and K. W. Whang, "Effects of Magnetic Fields on A Planar Inductively Coupled Argon Plasma," Plasma Sources Sci. Technol., Vol. 5
-
-
Lee, H.J.1
-
40
-
-
11744348780
-
-
p. 301.
-
J.A. Lehane and P.C. Thonemann, "Experimental study of helicon wave propagation in a gaseous plasma," in Proc. Phys. Soc., 1965, vol. 85, p. 301.
-
And P.C. Thonemann, "Experimental Study of Helicon Wave Propagation in A Gaseous Plasma," in Proc. Phys. Soc., 1965, Vol. 85
-
-
Lehane, J.A.1
-
41
-
-
36449003200
-
-
p. 1084, 1995.
-
M. Light and F.F. Chen, "Helicon wave excitation with helical antennas," Phys. Plasmas, vol. 2, p. 1084, 1995.
-
And F.F. Chen, "Helicon Wave Excitation with Helical Antennas," Phys. Plasmas, Vol. 2
-
-
Light, M.1
-
42
-
-
0001027479
-
-
p. 4094, 1995.
-
M. Light, I.D. Sudit, F.F. Chen, and D. Arnush, "Axial propagation of helicon waves," Phys. Plasmas, vol. 2, p. 4094, 1995.
-
I.D. Sudit, F.F. Chen, and D. Arnush, "Axial Propagation of Helicon Waves," Phys. Plasmas, Vol. 2
-
-
Light, M.1
-
43
-
-
0012038174
-
-
p. 229, 1995.
-
P.K. Loewenhardt, B.D. Blackwell, and S. M. Hamberger, "Helicon wave propagation in the SHEILA heliac," Plasma Phys. Control Fusion, vol. 37, p. 229, 1995.
-
B.D. Blackwell, and S. M. Hamberger, "Helicon Wave Propagation in the SHEILA Heliac," Plasma Phys. Control Fusion, Vol. 37
-
-
Loewenhardt, P.K.1
-
44
-
-
3743136788
-
-
p. 2792, 1991.
-
P.K. Loewenhardt, B.D. Blackwell, R. W. Boswell, G. D. Conway, and S. M. Hamberger, "Plasma production in a toroidal heliac by helicon waves," Phys. Rev. Lett., vol. 67, p. 2792, 1991.
-
B.D. Blackwell, R. W. Boswell, G. D. Conway, and S. M. Hamberger, "Plasma Production in A Toroidal Heliac by Helicon Waves," Phys. Rev. Lett., Vol. 67
-
-
Loewenhardt, P.K.1
-
46
-
-
6244285178
-
-
p. 233, 1997.
-
A.W. Molvik, A.R. Ellingboe, and T. D. Rognlien, "Hot-electron production and wave structure in a helicon plasma source," Phys. Rev. Lett., vol. 79, p. 233, 1997.
-
A.R. Ellingboe, and T. D. Rognlien, "Hot-electron Production and Wave Structure in A Helicon Plasma Source," Phys. Rev. Lett., Vol. 79
-
-
Molvik, A.W.1
-
47
-
-
0001115805
-
-
p. 984, 1996.
-
A.W. Molvik, T.D. Rognlien, J. A. Byers, R. H. Cohen, A. R. Ellingboe, E. B. Hooper, H. S. McLean, B. W. Stallard, and P. A. Vitello, "Experiments and modeling of a helicon source," J. Vac. Sci. Technol. A, vol. 14, p. 984, 1996.
-
T.D. Rognlien, J. A. Byers, R. H. Cohen, A. R. Ellingboe, E. B. Hooper, H. S. McLean, B. W. Stallard, and P. A. Vitello, "Experiments and Modeling of A Helicon Source," J. Vac. Sci. Technol. A, Vol. 14
-
-
Molvik, A.W.1
-
48
-
-
0029289364
-
-
p. 2152, 1995.
-
K. Nakamura, K. Suzuki, and H. Sugai, "Hot spots and electron heating processes in a helicon-wave excited plasma," Jpn.J. Appl. Phys., vol. 34, p. 2152, 1995.
-
K. Suzuki, and H. Sugai, "Hot Spots and Electron Heating Processes in A Helicon-wave Excited Plasma," Jpn.J. Appl. Phys., Vol. 34
-
-
Nakamura, K.1
-
49
-
-
0001208027
-
-
p. 1695, 1996.
-
Y. Sakawa, N. Koshikawa, and T. Shoji, "Characteristics of the high density plasma production by m = 0 helicon wave," Appl. Phys. Lett., vol. 69, p. 1695, 1996.
-
N. Koshikawa, and T. Shoji, "Characteristics of the High Density Plasma Production by M = 0 Helicon Wave," Appl. Phys. Lett., Vol. 69
-
-
Sakawa, Y.1
-
51
-
-
33747603996
-
-
p. 1334.
-
Y. Sakawa, T. Shoji, T. Takino, Y. Kuroki, and K. Shimura, "Physics of high density plasma production by helicon waves," in Int. Conf. Plasma Phys., Nagoya, Japan, 1996, Abstract 12K10, p. 1334.
-
T. Shoji, T. Takino, Y. Kuroki, and K. Shimura, "Physics of High Density Plasma Production by Helicon Waves," in Int. Conf. Plasma Phys., Nagoya, Japan, 1996, Abstract 12K10
-
-
Sakawa, Y.1
-
52
-
-
0031268652
-
-
p. 2864, 1997.
-
K.P. Shamrai, V.F. Virko, H.-O. Blom, V. P. Pavlenko, V. B. Taranov, L. B. Jonsson, C. Hedlund, and S. Berg, "Discharge disruptions in a helicon plasma source," J. Vac. Sci. Technol. A, vol. 15, p. 2864, 1997.
-
V.F. Virko, H.-O. Blom, V. P. Pavlenko, V. B. Taranov, L. B. Jonsson, C. Hedlund, and S. Berg, "Discharge Disruptions in A Helicon Plasma Source," J. Vac. Sci. Technol. A, Vol. 15
-
-
Shamrai, K.P.1
-
53
-
-
0001339212
-
-
p. 1015, 1995.
-
S. Shinohara, Y. Miyauchi, and Y. Kawai, "Dynamic plasma behavior excited by m = ±1 helicon wave," Plasma Phys. Control Fusion, vol. 37, p. 1015, 1995.
-
Y. Miyauchi, and Y. Kawai, "Dynamic Plasma Behavior Excited by M = ±1 Helicon Wave," Plasma Phys. Control Fusion, Vol. 37
-
-
Shinohara, S.1
-
55
-
-
0031233250
-
-
p. 1479, 1997.
-
S. Shinohara, S. Takechi, N. Kaneda, and Y. Kawai, "Helicon m = 0 mode characteristics in large-diameter plasma produced by a planar spiral antenna," Plasma Phys. Control Fusion, vol. 39, p. 1479, 1997.
-
S. Takechi, N. Kaneda, and Y. Kawai, "Helicon M = 0 Mode Characteristics in Large-diameter Plasma Produced by A Planar Spiral Antenna," Plasma Phys. Control Fusion, Vol. 39
-
-
Shinohara, S.1
-
59
-
-
0001911317
-
-
p. 5, 1993.
-
T. Shoji, Y. Sakawa, S. Nakazawa, K. Kadota, and T. Sato, "Plasma production by helicon waves," Plasma Sources Sci. Technol., vol. 2, p. 5, 1993.
-
Y. Sakawa, S. Nakazawa, K. Kadota, and T. Sato, "Plasma Production by Helicon Waves," Plasma Sources Sci. Technol., Vol. 2
-
-
Shoji, T.1
-
60
-
-
84956038204
-
-
p. 2476, 1995.
-
J.E. Stevens, M.J. Sowa, and J. L. Cecchi, "Helicon plasma source excited by a flat spiral coil," J. Vac. Sci. Technol. A, vol. 13, p. 2476, 1995.
-
M.J. Sowa, and J. L. Cecchi, "Helicon Plasma Source Excited by A Flat Spiral Coil," J. Vac. Sci. Technol. A, Vol. 13
-
-
Stevens, J.E.1
-
61
-
-
0030073720
-
-
p. 43, 1996.
-
I.D. Sudit and F.F. Chen, "Discharge equilibrium of a helicon plasma," Plasma Sources Sci. Technol., vol. 4, p. 43, 1996.
-
And F.F. Chen, "Discharge Equilibrium of A Helicon Plasma," Plasma Sources Sci. Technol., Vol. 4
-
-
Sudit, I.D.1
-
62
-
-
0031140096
-
-
A445, 1997.
-
H. Sugai, T.H. Ahn, I. Ghanashev, M. Goto, M. Nagatsu, K. Nakamura, K. Suzuki, and H. Toyoda, "Diagnostics for advanced plasma control of materials processing," Plasma Phys. Control Fusion, vol. 39, p. A445, 1997.
-
T.H. Ahn, I. Ghanashev, M. Goto, M. Nagatsu, K. Nakamura, K. Suzuki, and H. Toyoda, "Diagnostics for Advanced Plasma Control of Materials Processing," Plasma Phys. Control Fusion, Vol. 39, P.
-
-
Sugai, H.1
-
63
-
-
0030193688
-
-
p. 4044, 1996.
-
K. Suzuki, K. Nakamura, and H. Sugai, "Resonant directional excitation of helicon waves by a helical antenna," Jpn.J. Appl. Phys., vol. 35, p. 4044, 1996.
-
K. Nakamura, and H. Sugai, "Resonant Directional Excitation of Helicon Waves by A Helical Antenna," Jpn.J. Appl. Phys., Vol. 35
-
-
Suzuki, K.1
-
64
-
-
33747626140
-
-
p. 1065, 1994.
-
N.F. Vorob'ev and A.A. Rukhadze, "Excitation of a helicon in a plasma cylinder by surface current sources," Plasma Phys. Rep., vol. 20, p. 1065, 1994.
-
And A.A. Rukhadze, "Excitation of A Helicon in A Plasma Cylinder by Surface Current Sources," Plasma Phys. Rep., Vol. 20
-
-
Vorob'Ev, N.F.1
-
65
-
-
0028530088
-
-
p. 5950, 1994.
-
Y. Yasaka and Y. Hara, "Role of helicon waves on high-density plasma production," Jpn.J. Appl. Phys., vol. 33, p. 5950, 1994.
-
And Y. Hara, "Role of Helicon Waves on High-density Plasma Production," Jpn.J. Appl. Phys., Vol. 33
-
-
Yasaka, Y.1
-
66
-
-
0001766251
-
-
p. 673, 1997.
-
S.M. Yun, J.H. Kim, and H. Y. Chang, "Frequency dependence of helicon wave plasmas near lower hybrid resonance frequency," J. Vac. Sci. Technol. A, vol. 15, p. 673, 1997.
-
J.H. Kim, and H. Y. Chang, "Frequency Dependence of Helicon Wave Plasmas Near Lower Hybrid Resonance Frequency," J. Vac. Sci. Technol. A, Vol. 15
-
-
Yun, S.M.1
-
68
-
-
0942294663
-
-
p. 803, 1995.
-
B.C. Zhang, G.G. Borg, and B. D. Blackwell, "Helicon wave excitation and propagation in a toroidal heliac: Experiment and theory," Phys. Plasmas, vol. 2, p. 803, 1995.
-
G.G. Borg, and B. D. Blackwell, "Helicon Wave Excitation and Propagation in A Toroidal Heliac: Experiment and Theory," Phys. Plasmas, Vol. 2
-
-
Zhang, B.C.1
-
69
-
-
33744745046
-
-
p. 2805, 1989.
-
P. Zhu and R.W. Boswell, "Aril laser generated by Landau damping of whistler waves at the lower hybrid frequency," Phys. Rev. Lett., vol. 63, p. 2805, 1989.
-
And R.W. Boswell, "Aril Laser Generated by Landau Damping of Whistler Waves at the Lower Hybrid Frequency," Phys. Rev. Lett., Vol. 63
-
-
Zhu, P.1
-
72
-
-
0026641844
-
-
p. 153.
-
N.M.P. Benjamin, K. R. Krieg, and G. T. Grover, "Tessellated probe as an aid to process development," in Process Module Metrology, Control, Clustering; Proc. SPIE, 1991, vol. 1594, p. 153.
-
K. R. Krieg, and G. T. Grover, "Tessellated Probe As An Aid to Process Development," in Process Module Metrology, Control, Clustering; Proc. SPIE, 1991, Vol. 1594
-
-
Benjamin, N.M.P.1
-
78
-
-
33845400616
-
-
p. 87, 1940.
-
M.J. Druyvesteyn and F.M. Penning, "Mechanism of electric discharges in gases of low pressure," Rev. Mod. Phys., vol. 12, p. 87, 1940.
-
And F.M. Penning, "Mechanism of Electric Discharges in Gases of Low Pressure," Rev. Mod. Phys., Vol. 12
-
-
Druyvesteyn, M.J.1
-
79
-
-
0001682261
-
-
p. 2000, 1996.
-
F. Heinrich, U. Baenziger, A. Jentzsch, G. Neumann, and C. Huth, "Novel high-density plasma tool for large area flat panel display etching," J. Vac. Sci. Technol. B, vol. 14, p. 2000, 1996.
-
U. Baenziger, A. Jentzsch, G. Neumann, and C. Huth, "Novel High-density Plasma Tool for Large Area Flat Panel Display Etching," J. Vac. Sci. Technol. B, Vol. 14
-
-
Heinrich, F.1
-
81
-
-
5644268626
-
-
p. 40, 1994.
-
S.W. Lam and N. Hershkowitz, "A new ion pitch-angle diagnostic for magnetized plasmas," Plasma Sources Sci. Technol., vol. 3, p. 40, 1994.
-
And N. Hershkowitz, "A New Ion Pitch-angle Diagnostic for Magnetized Plasmas," Plasma Sources Sci. Technol., Vol. 3
-
-
Lam, S.W.1
-
82
-
-
0015636413
-
-
p. 726, 1973.
-
R. Limpaecher and K.R. MacKenzie, "Magnetic multipole containment of large uniform collisionless quiescent plasmas," Rev. Sci. Instrum., vol. 44, p. 726, 1973.
-
And K.R. MacKenzie, "Magnetic Multipole Containment of Large Uniform Collisionless Quiescent Plasmas," Rev. Sci. Instrum., Vol. 44
-
-
Limpaecher, R.1
-
85
-
-
0022810777
-
-
p. 1491, 1986.
-
S. Okamura, K. Adati, T. Aoki, D.R. Baker, H. Fujita, H.R. Garner, K. Hattori, S. Hidekuma, T. Kawamoto, R. Kumazawa, Y. Okubo, and T. Sato, "Plasma production with rotating ion cyclotron waves excited by Nagoya Type-III antennas in RFC-XX," Nuclear Fusion, vol. 26, p. 1491, 1986.
-
K. Adati, T. Aoki, D.R. Baker, H. Fujita, H.R. Garner, K. Hattori, S. Hidekuma, T. Kawamoto, R. Kumazawa, Y. Okubo, and T. Sato, "Plasma Production with Rotating Ion Cyclotron Waves Excited by Nagoya Type-III Antennas in RFC-XX," Nuclear Fusion, Vol. 26
-
-
Okamura, S.1
-
86
-
-
33747600193
-
-
IPPJ-653, 1983.
-
T. Sato, S. Okamura, K. Adati, T. Aoki, D.R. Baker, H. Fujita, H.R. Garner, K. Hattori, S. Hidekuma, T. Kawamoto, R. Kumazawa, Y. Okubo, and K. Uchino, "Buildup and sustainment of 1013 cm~3 plasma by ICRF in RFC-XX," Nagoya Univ. Inst. Plasma Phys., Rep. IPPJ-653, 1983.
-
S. Okamura, K. Adati, T. Aoki, D.R. Baker, H. Fujita, H.R. Garner, K. Hattori, S. Hidekuma, T. Kawamoto, R. Kumazawa, Y. Okubo, and K. Uchino, "Buildup and Sustainment of 1013 Cm~3 Plasma by ICRF in RFC-XX," Nagoya Univ. Inst. Plasma Phys., Rep.
-
-
Sato, T.1
-
87
-
-
0343479572
-
-
p. 162, 1994.
-
I.D. Sudit and F.F. Chen, "RF compensated probes for high-density discharges," Plasma Sources Sci. Technol., vol. 3, p. 162, 1994.
-
And F.F. Chen, "RF Compensated Probes for High-density Discharges," Plasma Sources Sci. Technol., Vol. 3
-
-
Sudit, I.D.1
-
88
-
-
0000732666
-
-
p. 2076, 1978. PROCESSING
-
T. Watari, T. Hatori, R. Kumazawa, S. Hidekuma, T. Aoki, T. Kawamoto, M. Inutake, S. Hiroe, A. Nishizawa, K. Adati, T. Sato, T. Watanabe, H. Obayashi, and K. Takayama, "Radio-frequency plugging of a high density plasma," Phys. Fluids, vol. 21, p. 2076, 1978. PROCESSING
-
T. Hatori, R. Kumazawa, S. Hidekuma, T. Aoki, T. Kawamoto, M. Inutake, S. Hiroe, A. Nishizawa, K. Adati, T. Sato, T. Watanabe, H. Obayashi, and K. Takayama, "Radio-frequency Plugging of A High Density Plasma," Phys. Fluids, Vol. 21
-
-
Watari, T.1
-
89
-
-
0002560086
-
-
p. 96, 1996.
-
F.H. Bell, O. Joubert, and L. Vallier, "Polysilicon gate etching in high density plasmas.I. Process optimization using a chlorine-based chemistry," J. Vac. Sci. Technol. B, vol. 14, p. 96, 1996.
-
O. Joubert, and L. Vallier, "Polysilicon Gate Etching in High Density Plasmas.I. Process Optimization Using A Chlorine-based Chemistry," J. Vac. Sci. Technol. B, Vol. 14
-
-
Bell, F.H.1
-
90
-
-
0025843212
-
-
p. 95, 1990.
-
N. Benjamin, B. Chapman, and R. Boswell, "Progress of an advanced diffusion source plasma reactor," in Advanced Tech. Integrated Circuit Process., Proc. SPIE, vol. 1392, p. 95, 1990.
-
B. Chapman, and R. Boswell, "Progress of An Advanced Diffusion Source Plasma Reactor," in Advanced Tech. Integrated Circuit Process., Proc. SPIE, Vol. 1392
-
-
Benjamin, N.1
-
92
-
-
36549095761
-
-
p. 3123, 1987.
-
R.W. Boswell and R.K. Porteus, "Etching in a pulsed plasma," J. Appl. Phys., vol. 62, p. 3123, 1987.
-
And R.K. Porteus, "Etching in A Pulsed Plasma," J. Appl. Phys., Vol. 62
-
-
Boswell, R.W.1
-
93
-
-
84957231715
-
-
p. 3345, 1989.
-
R.W. Boswell, A.J. Perry, and M. Emami, "Multipole confined diffusion plasma produced by 13.56 MHz electrodeless source," J. Vac. Sci. Technol. A, vol. 7, p. 3345, 1989.
-
A.J. Perry, and M. Emami, "Multipole Confined Diffusion Plasma Produced by 13.56 MHz Electrodeless Source," J. Vac. Sci. Technol. A, Vol. 7
-
-
Boswell, R.W.1
-
94
-
-
33747615318
-
-
p. 1803.
-
G.A. Campbell, A. de Chambrier, F. Mendoza, N.W. Parker, D. I. C. Pearson, K. Tokunaga, T. Tsukada, S. Mashiro, and H. Nogami, "MORI, a high density rf plasma source for etching of polysilicon and metal films on wafers," in Proc. Soc. Photo-Opt. Instrument. Eng., 1992, vol. 226, p. 1803.
-
A. de Chambrier, F. Mendoza, N.W. Parker, D. I. C. Pearson, K. Tokunaga, T. Tsukada, S. Mashiro, and H. Nogami, "MORI, A High Density Rf Plasma Source for Etching of Polysilicon and Metal Films on Wafers," in Proc. Soc. Photo-Opt. Instrument. Eng., 1992, Vol. 226
-
-
Campbell, G.A.1
-
95
-
-
0025684175
-
-
Coalers, 1990.
-
G.A. Campbell, D.I. C. Pearson, and A. P. deChambrier, "High ion flux rf source for ion assisted processes," in Proc. 33rd Annu. Techn. Conf., Soc. Vacuum Coalers, 1990.
-
D.I. C. Pearson, and A. P. DeChambrier, "High Ion Flux Rf Source for Ion Assisted Processes," in Proc. 33rd Annu. Techn. Conf., Soc. Vacuum
-
-
Campbell, G.A.1
-
96
-
-
33747602629
-
-
Tokyo, 1991.
-
B. Chapman, N. Benjamin, C.F.A. van Os, R. W. Boswell, and A. J. Perry, "Plasma dry processing in the helicon reactor," in 12th Symp. Dry Process, Denki-Gakkai, Tokyo, 1991.
-
N. Benjamin, C.F.A. Van Os, R. W. Boswell, and A. J. Perry, "Plasma Dry Processing in the Helicon Reactor," in 12th Symp. Dry Process, Denki-Gakkai
-
-
Chapman, B.1
-
98
-
-
84957350105
-
-
p. 2954, 1993.
-
C. Charles, G. Giroult-Matlakowski, R.W. Boswell, A. Goullet, G. Turban, and C. Cardinaud, "Characterization of silicon dioxide films deposited at low pressure and temperature in a helicon diffusion reactor," J. Vac. Sci. Technol. A, vol. 11, p. 2954, 1993.
-
G. Giroult-Matlakowski, R.W. Boswell, A. Goullet, G. Turban, and C. Cardinaud, "Characterization of Silicon Dioxide Films Deposited at Low Pressure and Temperature in A Helicon Diffusion Reactor," J. Vac. Sci. Technol. A, Vol. 11
-
-
Charles, C.1
-
99
-
-
33747618803
-
-
RA-4.
-
T.J. Dalton and H.H. Sawin, "Spatially resolved plasma and wafer surface potential measurements," in Gaseous Electronics Conf., Montreal, Canada, 1993, Abstract RA-4.
-
And H.H. Sawin, "Spatially Resolved Plasma and Wafer Surface Potential Measurements," in Gaseous Electronics Conf., Montreal, Canada, 1993, Abstract
-
-
Dalton, T.J.1
-
101
-
-
33747619235
-
-
AA-1.
-
G.W. Gibson, Jr., N. Blayo, D. Ibbotson, J.T. C. Lee, H. H. Sawin, and I. Tepermeister, "Side by side comparison of ion energy distribution functions for helicon and multipolar ECR sources in an HBr discharge," in Gaseous Electronics Conf., Montreal, Canada, 1993, Abstract AA-1.
-
Jr., N. Blayo, D. Ibbotson, J.T. C. Lee, H. H. Sawin, and I. Tepermeister, "Side by Side Comparison of Ion Energy Distribution Functions for Helicon and Multipolar ECR Sources in An HBr Discharge," in Gaseous Electronics Conf., Montreal, Canada, 1993, Abstract
-
-
Gibson, G.W.1
-
102
-
-
21844502545
-
-
p. 2754, 1994.
-
G. Giroult-Matlakowski, C. Charles, A. Durandot, R.W. Boswell, S. Armand, H.M. Persing, A. J. Perry, P. D. Lloyd, S. R. Hyde, and D. Bogsanyi, "Deposition of silicon dioxide films using the helicon diffusion reactor for integrated optics applications," J. Vac. Sci. Technol. A, vol. 12, p. 2754, 1994.
-
C. Charles, A. Durandot, R.W. Boswell, S. Armand, H.M. Persing, A. J. Perry, P. D. Lloyd, S. R. Hyde, and D. Bogsanyi, "Deposition of Silicon Dioxide Films Using the Helicon Diffusion Reactor for Integrated Optics Applications," J. Vac. Sci. Technol. A, Vol. 12
-
-
Giroult-Matlakowski, G.1
-
104
-
-
0027612085
-
-
p. 3019, 1993.
-
N. Jiwari, H. Iwasawa, A. Narai, H. Sakaue, H. Shindo, T. Shoji, and Y. Horiike, "Al etching characteristics employing helicon wave plasma," Jpn J. Appl. Phys., vol. 32, p. 3019, 1993.
-
H. Iwasawa, A. Narai, H. Sakaue, H. Shindo, T. Shoji, and Y. Horiike, "Al Etching Characteristics Employing Helicon Wave Plasma," Jpn J. Appl. Phys., Vol. 32
-
-
Jiwari, N.1
-
105
-
-
33747616965
-
-
Yokohama, 1994.
-
K. Kadota, Y. Konno, K. Aoto, T. Shoji, and T. Sato, "Density measurements of O-atoms in helicon wave oxygen discharge by twophoton laser-induced fluorescence," in Proc. 2nd Int. Conf. Reactive Plasmas, Yokohama, 1994.
-
Y. Konno, K. Aoto, T. Shoji, and T. Sato, "Density Measurements of O-atoms in Helicon Wave Oxygen Discharge by Twophoton Laser-induced Fluorescence," in Proc. 2nd Int. Conf. Reactive Plasmas
-
-
Kadota, K.1
-
106
-
-
33747621216
-
-
Yokohama, 1994.
-
T. Kamo, T. Mieno, T. Shoji, and K. Kadota, "Measurement of ion fractions in helicon wave CF4 plasma by TOP mass analysis," in Proc. 2nd Int. Conf. Reactive Plasmas, Yokohama, 1994.
-
T. Mieno, T. Shoji, and K. Kadota, "Measurement of Ion Fractions in Helicon Wave CF4 Plasma by TOP Mass Analysis," in Proc. 2nd Int. Conf. Reactive Plasmas
-
-
Kamo, T.1
-
107
-
-
0003841451
-
-
p. 11, 1993.
-
H. Kitagawa, A. Tsunoda, H. Shindo, and Y. Horiike, "Etching characteristics in helicon wave plasma," Plasma Sources Sci. Technol., vol. 2, p. 11, 1993.
-
A. Tsunoda, H. Shindo, and Y. Horiike, "Etching Characteristics in Helicon Wave Plasma," Plasma Sources Sci. Technol., Vol. 2
-
-
Kitagawa, H.1
-
108
-
-
33747621917
-
-
p. 543, 1996.
-
R. Kraft, T. Boonstra, and S. Prengle, "Etching 0.35 mm polysilicon gates on a high-density helicon etcher," J. Vac. Sci. Technol. B, vol. 14, p. 543, 1996.
-
T. Boonstra, and S. Prengle, "Etching 0.35 Mm Polysilicon Gates on A High-density Helicon Etcher," J. Vac. Sci. Technol. B, Vol. 14
-
-
Kraft, R.1
-
109
-
-
0000662169
-
-
p. 617, 1996.
-
T. Mieno, T. Kamo, D. Hayashi, T. Shoji, and K. Kadota, "Efficient production of O+ and O~ ions in a helicon wave oxygen discharge," Appl. Phys. Lett., vol. 69, p. 617, 1996.
-
T. Kamo, D. Hayashi, T. Shoji, and K. Kadota, "Efficient Production of O+ and O~ Ions in A Helicon Wave Oxygen Discharge," Appl. Phys. Lett., Vol. 69
-
-
Mieno, T.1
-
110
-
-
0006102757
-
-
p. 2675, 1991.
-
T. Mieno, T. Shoji, and K. Kadota, "Control of hydrocarbon radicals and film deposition by using a whistler wave discharge in range of radio frequency," Appl. Phys. Lett., vol. 59, p. 2675, 1991.
-
T. Shoji, and K. Kadota, "Control of Hydrocarbon Radicals and Film Deposition by Using A Whistler Wave Discharge in Range of Radio Frequency," Appl. Phys. Lett., Vol. 59
-
-
Mieno, T.1
-
113
-
-
0030134271
-
-
p. 181, 1996.
-
H. Nogami, Y. Ogahara, K. Mashimo, Y. Nakagawa, and T. Tsukada, "SiC>2 etching by m = 0 helicon plasma," Plasma Sources Sci. Technol., vol. 5, p. 181, 1996.
-
2 Etching by M = 0 Helicon Plasma," Plasma Sources Sci Technol , Vol 5"');">Y. Ogahara, K. Mashimo, Y. Nakagawa, and T. Tsukada, "SiC>2 Etching by M = 0 Helicon Plasma," Plasma Sources Sci. Technol., Vol. 5
-
-
Nogami, H.1
-
114
-
-
36549093586
-
-
p. 148, 1989.
-
A.J. Perry and R.W. Boswell, "Fast anisotropic etching of silicon in an inductively coupled plasma reactor," Appl. Phys. Lett., vol. 55, p. 148, 1989.
-
And R.W. Boswell, "Fast Anisotropic Etching of Silicon in An Inductively Coupled Plasma Reactor," Appl. Phys. Lett., Vol. 55
-
-
Perry, A.J.1
-
115
-
-
33747614185
-
-
p. 310, 1991.
-
A.J. Perry, D. Vender, and R.W. Boswell, "Application of the helicon source to plasma processing," J. Vac. Sci. Technol. B, vol. 9, p. 310, 1991.
-
D. Vender, and R.W. Boswell, "Application of the Helicon Source to Plasma Processing," J. Vac. Sci. Technol. B, Vol. 9
-
-
Perry, A.J.1
-
116
-
-
84955050289
-
-
p. 2930, 1995.
-
R. Petri, N. Sadeghi, and D. Henry, "Measurement of the amount of oxygen generated by quartz source walls in a SFg dense plasma: Application to a helicon reactor," J. Vac. Sci. Technol. A, vol. 13, p. 2930, 1995.
-
N. Sadeghi, and D. Henry, "Measurement of the Amount of Oxygen Generated by Quartz Source Walls in A SFg Dense Plasma: Application to A Helicon Reactor," J. Vac. Sci. Technol. A, Vol. 13
-
-
Petri, R.1
-
117
-
-
0030527610
-
-
p. 649, 1996.
-
G.S. Selwyn and A.D. Bailey, III, "Particle contamination characterization in a helicon plasma etching tool," J. Vac. Sci. Technol. A, vol. 14, p. 649, 1996.
-
And A.D. Bailey, III, "Particle Contamination Characterization in A Helicon Plasma Etching Tool," J. Vac. Sci. Technol. A, Vol. 14
-
-
Selwyn, G.S.1
-
118
-
-
33747596509
-
-
p. 377.
-
T. Shoji, T. Mieno, and K. Kadota, "Control of energy distribution of electrons and hydrocarbon film deposition by whistler wave discharge," in Proc. Int. Sem. Reactive Plasmas, Nagoya, Japan, 1991, p. 377.
-
T. Mieno, and K. Kadota, "Control of Energy Distribution of Electrons and Hydrocarbon Film Deposition by Whistler Wave Discharge," in Proc. Int. Sem. Reactive Plasmas, Nagoya, Japan, 1991
-
-
Shoji, T.1
-
120
-
-
33747619925
-
-
p. 2310, 1994.
-
I. Tepermeister, D.E. Ibbotson, J.T. C. Lee, and H. H. Sawin, "Comparison of advanced plasma sources for etching applications. I. Etching rate, uniformity, and profile control in a helicon and a multiple electron cyclotron resonance source," J. Vac. Sci. Technol. B, vol. 12, p. 2310, 1994.
-
D.E. Ibbotson, J.T. C. Lee, and H. H. Sawin, "Comparison of Advanced Plasma Sources for Etching Applications. I. Etching Rate, Uniformity, and Profile Control in A Helicon and A Multiple Electron Cyclotron Resonance Source," J. Vac. Sci. Technol. B, Vol. 12
-
-
Tepermeister, I.1
-
123
-
-
0028463175
-
-
p. 4433, 1994.
-
T. Tsukada, H. Nogami, Y. Nakagawa, and E. Wani, "Etching characteristics by m = 0 helicon wave plasma," Jpn.J. Appl. Phys., vol. 33, p. 4433, 1994.
-
H. Nogami, Y. Nakagawa, and E. Wani, "Etching Characteristics by M = 0 Helicon Wave Plasma," Jpn.J. Appl. Phys., Vol. 33
-
-
Tsukada, T.1
-
124
-
-
0001048197
-
-
PAPERS
-
G.R. Tynan, A.D. Bailey, III, G. A. Campbell, R. Charatan, A. de Chambrier, G. Gibson, D. J. Hemker, K. Jones, A. Kuthi, C. Lee, T. Shoji, and M. Wilcoxson, "Characterization of an azimuthally symmetric helicon wave high density plasma source," J. Vac. Sci. Technol. A., vol. 15, p. 2885, 1997. REVIEW PAPERS
-
A.D. Bailey, III, G. A. Campbell, R. Charatan, A. de Chambrier, G. Gibson, D. J. Hemker, K. Jones, A. Kuthi, C. Lee, T. Shoji, and M. Wilcoxson, "Characterization of An Azimuthally Symmetric Helicon Wave High Density Plasma Source," J. Vac. Sci. Technol. A., Vol. 15, P. 2885, 1997. REVIEW
-
-
Tynan, G.R.1
-
128
-
-
33747620138
-
-
ch. 1.
-
"Helicon plasma sources," in High Density Plasma Sources, O.A. Popov, Ed. Park Ridge, NJ: Noyes, 1996, ch. 1.
-
Plasma Sources," in High Density Plasma Sources, O.A. Popov, Ed. Park Ridge, NJ: Noyes, 1996
-
-
-
132
-
-
33747600959
-
-
STATE
-
T. Nakano, R.A. Gottscho, N. Sadeghi, D.J. Trevor, R. W. Boswell, A. J. Perry, T. C. Lee, K. P. Giapis, and J. Margot, "Helicon wave excited plasmas," Jpn. Soc. Appl. Phys., Oyo Buturi, vol. 61, p. 711, 1992. SOLID STATE
-
R.A. Gottscho, N. Sadeghi, D.J. Trevor, R. W. Boswell, A. J. Perry, T. C. Lee, K. P. Giapis, and J. Margot, "Helicon Wave Excited Plasmas," Jpn. Soc. Appl. Phys., Oyo Buturi, Vol. 61, P. 711, 1992. SOLID
-
-
Nakano, T.1
-
134
-
-
4243884747
-
-
p. 339, 1961.
-
R. Bowers, C. Legendy, and F.E. Rose, "Oscillatory galvanomagnetic effect in metallic sodium," Phys. Rev. Lett., vol. 7, p. 339, 1961.
-
C. Legendy, and F.E. Rose, "Oscillatory Galvanomagnetic Effect in Metallic Sodium," Phys. Rev. Lett., Vol. 7
-
-
Bowers, R.1
-
135
-
-
4043160774
-
-
p. 317.
-
G.N. Harding and P.C. Thonemann, "A study of helicon waves in indium," in Proc. Phys. Soc., 1965, vol. 85, p. 317.
-
And P.C. Thonemann, "A Study of Helicon Waves in Indium," in Proc. Phys. Soc., 1965, Vol. 85
-
-
Harding, G.N.1
-
136
-
-
36149014726
-
-
p. 1122, 1962.
-
F.E. Rose, M.T. Taylor, and R. Bowers, "Low-frequency magnetoplasma resonances in sodium," Phys. Rev., vol. 127, p. 1122, 1962.
-
M.T. Taylor, and R. Bowers, "Low-frequency Magnetoplasma Resonances in Sodium," Phys. Rev., Vol. 127
-
-
Rose, F.E.1
-
139
-
-
33747611040
-
-
p. 1539, 1995.
-
D. Arnush and A. Peskoff, "Helicon waves in a flaring magnetic field," Plasma Phys. Control Fusion, vol. 38, p. 1539, 1995.
-
And A. Peskoff, "Helicon Waves in A Flaring Magnetic Field," Plasma Phys. Control Fusion, Vol. 38
-
-
Arnush, D.1
-
141
-
-
33747619004
-
-
p. 501, 1966.
-
H.A. Bleven and P.J. Christiansen, "Propagation of helicon waves in a nonuniform plasma," Aust. J. Phys., vol. 19, p. 501, 1966.
-
And P.J. Christiansen, "Propagation of Helicon Waves in A Nonuniform Plasma," Aust. J. Phys., Vol. 19
-
-
Bleven, H.A.1
-
143
-
-
4043145334
-
-
p. 230, 1968
-
H.A. Bleven, P.J. Christiansen, and B. Davies, "Effect of electron cyclotron resonance on helicon waves," Phys. Rev. Lett. A, vol. 28, p. 230, 1968
-
P.J. Christiansen, and B. Davies, "Effect of Electron Cyclotron Resonance on Helicon Waves," Phys. Rev. Lett. A, Vol. 28
-
-
Bleven, H.A.1
-
145
-
-
0031098448
-
-
p. 529, 1997.
-
G.G. Borg and I.V. Kamenski, "Collisionless energy coupling to electrons by helicon waves in the near field of an antenna," Phys. Plasmas, vol. 4, p. 529, 1997.
-
And I.V. Kamenski, "Collisionless Energy Coupling to Electrons by Helicon Waves in the Near Field of An Antenna," Phys. Plasmas, Vol. 4
-
-
Borg, G.G.1
-
149
-
-
0026141648
-
-
p. 141, 1991.
-
R.W. Boswell and D. Vender, "Simulation of pulsed electropositive and electronegative plasmas," IEEE Trans. Plasma Sei, vol. 19, p. 141, 1991.
-
And D. Vender, "Simulation of Pulsed Electropositive and Electronegative Plasmas," IEEE Trans. Plasma Sei, Vol. 19
-
-
Boswell, R.W.1
-
151
-
-
33747598106
-
-
p. 1378.
-
"Helicon wave plasma sources," in Proc. Int. Conf. Plasma Phys., Kiev, USSR. Singapore: World Scientific, 1987, vol. 2, p. 1378.
-
Wave Plasma Sources," in Proc. Int. Conf. Plasma Phys., Kiev, USSR. Singapore: World Scientific, 1987, Vol. 2
-
-
-
156
-
-
33747627917
-
-
p. 2101, 1990.
-
F.F. Chen and C.D. Decker, "Plane-polarized whistler waves," Bull. Amer. Phys. Soc., vol. 35, p. 2101, 1990.
-
And C.D. Decker, "Plane-polarized Whistler Waves," Bull. Amer. Phys. Soc., Vol. 35
-
-
Chen, F.F.1
-
157
-
-
0000567662
-
-
p. 3411, 1997.
-
F.F. Chen and D. Arnush, "Generalized theory of helicon waves I: Normal modes," Phys. Plasmas, vol. 4, p. 3411, 1997.
-
And D. Arnush, "Generalized Theory of Helicon Waves I: Normal Modes," Phys. Plasmas, Vol. 4
-
-
Chen, F.F.1
-
158
-
-
0009384268
-
-
p. 49, 1994.
-
F.F. Chen, M.J. Hsieh, and M. Light, "Helicon waves in a nonuniform plasma," Plasma Sources Sci. Technol., vol. 3, p. 49, 1994.
-
M.J. Hsieh, and M. Light, "Helicon Waves in A Nonuniform Plasma," Plasma Sources Sci. Technol., Vol. 3
-
-
Chen, F.F.1
-
162
-
-
0346140184
-
-
p. 987, 1969.
-
B.J. Davies and P.J. Christiansen, "Helicon waves in a gaseous plasma," Plasma Phys., vol. 11, p. 987, 1969.
-
And P.J. Christiansen, "Helicon Waves in A Gaseous Plasma," Plasma Phys., Vol. 11
-
-
Davies, B.J.1
-
163
-
-
0004764551
-
-
p. 2748, 1997.
-
A.W. Degeling and R.W. Boswell, "Modeling ionization by helicon waves," Phys. Plasmas, vol. 4, p. 2748, 1997.
-
And R.W. Boswell, "Modeling Ionization by Helicon Waves," Phys. Plasmas, Vol. 4
-
-
Degeling, A.W.1
-
164
-
-
84971120853
-
-
p. 283, 1968.
-
R.L. Ferrari and J.P. Klozenberg, "Dispersion and attenuation of helicon waves in a cylindrical plasma-filled waveguide," J. Plasma Phys., vol. 2, p. 283, 1968.
-
And J.P. Klozenberg, "Dispersion and Attenuation of Helicon Waves in A Cylindrical Plasma-filled Waveguide," J. Plasma Phys., Vol. 2
-
-
Ferrari, R.L.1
-
165
-
-
0000806526
-
-
p. 2003, 1994.
-
B. Fischer, M. Kraemer, and Th. Enk, "Helicon wave coupling to a finite plasma column," Plasma Phys. Control Fusion, vol. 36, p. 2003, 1994.
-
M. Kraemer, and Th. Enk, "Helicon Wave Coupling to A Finite Plasma Column," Plasma Phys. Control Fusion, Vol. 36
-
-
Fischer, B.1
-
166
-
-
0031514879
-
-
p. 313, 1997.
-
G.I. Font and I.D. Boyd, "Numerical study of the effects of reactor geometry on a chlorine plasma helicon etch reactor," J. Vac. Sci. Technol. A, vol. 15, p. 313, 1997.
-
And I.D. Boyd, "Numerical Study of the Effects of Reactor Geometry on A Chlorine Plasma Helicon Etch Reactor," J. Vac. Sci. Technol. A, Vol. 15
-
-
Font, G.I.1
-
167
-
-
0001378447
-
-
p. 386, 1993.
-
[ 167] B.M. Harvey and C.N. Lashmore-Davies, "The absorption mechanisms of whistler waves in cool, dense, cylindrically bounded plasmas," Phys. Fluids B, vol. 5, p. 386, 1993.
-
And C.N. Lashmore-Davies, "The Absorption Mechanisms of Whistler Waves in Cool, Dense, Cylindrically Bounded Plasmas," Phys. Fluids B, Vol. 5
-
-
Harvey, B.M.1
-
168
-
-
33747617406
-
-
p. 3864, 1993.
-
"Reply to comments on 'the absorption mechanisms of whistler waves in cool, dense, cylindrically bounded plasmas,'" Phys. Fluids B, vol. 5, p. 3864, 1993.
-
To Comments on 'The Absorption Mechanisms of Whistler Waves in Cool, Dense, Cylindrically Bounded Plasmas,'" Phys. Fluids B, Vol. 5
-
-
-
169
-
-
0000349278
-
-
p. 4396, 1996.
-
I.V. Kamenski and G.G. Borg, "An evaluation of different antenna designs for helicon wave excitation in a cylindrical plasma source," Phys. Plasmas, vol. 3, p. 4396, 1996.
-
And G.G. Borg, "An Evaluation of Different Antenna Designs for Helicon Wave Excitation in A Cylindrical Plasma Source," Phys. Plasmas, Vol. 3
-
-
Kamenski, I.V.1
-
170
-
-
5244248928
-
-
p. 167, 1994.
-
G.S. Kirichenko, V.B. Taranov, K. P. Shamrai, and V. V. Yagola, "RF discharge in the fields of plasma resonator eigenmodes," Phys. Lett. A, vol. 191, p. 167, 1994.
-
V.B. Taranov, K. P. Shamrai, and V. V. Yagola, "RF Discharge in the Fields of Plasma Resonator Eigenmodes," Phys. Lett. A, Vol. 191
-
-
Kirichenko, G.S.1
-
171
-
-
0042138353
-
-
p. 545, 1965.
-
J.P. Klozenberg, B. McNamara, and P.C. Thonemann, "Dispersion and attenuation of helicon waves in a uniform cylindrical plasma," J. Fluid Mech., vol. 21, p. 545, 1965.
-
B. McNamara, and P.C. Thonemann, "Dispersion and Attenuation of Helicon Waves in A Uniform Cylindrical Plasma," J. Fluid Mech., Vol. 21
-
-
Klozenberg, J.P.1
-
172
-
-
0030086082
-
-
p. 152, 1996.
-
Y. Mouzouris and J.E. Scharer, "Modeling of profile effects for inductive helicon plasma sources," IEEE Trans. Plasma Sci., vol. 24, p. 152, 1996.
-
And J.E. Scharer, "Modeling of Profile Effects for Inductive Helicon Plasma Sources," IEEE Trans. Plasma Sci., Vol. 24
-
-
Mouzouris, Y.1
-
175
-
-
0038092980
-
-
p. 612, 1997.
-
K.P. Shamrai and V.P. Pavlenko, "RF power absorption and antenna impedance in an m = 0 helicon plasma source," Physica Scripta, vol. 55, p. 612, 1997.
-
And V.P. Pavlenko, "RF Power Absorption and Antenna Impedance in An M = 0 Helicon Plasma Source," Physica Scripta, Vol. 55
-
-
Shamrai, K.P.1
-
176
-
-
0031102789
-
-
p. 505, 1997.
-
K.P. Shamrai, V.P. Pavlenko, and V. B. Taranov, "Excitation, conversion and damping of waves in a helicon plasma source driven by an m = 0 antenna," Plasma Phys. Control Fusion, vol. 39, p. 505, 1997.
-
V.P. Pavlenko, and V. B. Taranov, "Excitation, Conversion and Damping of Waves in A Helicon Plasma Source Driven by An M = 0 Antenna," Plasma Phys. Control Fusion, Vol. 39
-
-
Shamrai, K.P.1
-
177
-
-
0028549759
-
-
p. 1719, 1994.
-
K.P. Shamrai and V.B. Taranov, "Resonance wave discharge and collisional energy absorption in helicon plasma source," Plasma Phys. Control Fusion, vol. 36, p. 1719, 1994.
-
And V.B. Taranov, "Resonance Wave Discharge and Collisional Energy Absorption in Helicon Plasma Source," Plasma Phys. Control Fusion, Vol. 36
-
-
Shamrai, K.P.1
-
180
-
-
0029405261
-
-
p. 1571, 1995.
-
S. Shinohara and Y. Kawai, "Estimation of electric fields from magnetic field distributions and an application to helicon wave," Jpn.J. Appl. Phys., vol. 34, p. 1571, 1995.
-
And Y. Kawai, "Estimation of Electric Fields from Magnetic Field Distributions and An Application to Helicon Wave," Jpn.J. Appl. Phys., Vol. 34
-
-
Shinohara, S.1
-
181
-
-
2942550513
-
-
p. 602, 1994.
-
I.D. Sudit and F.F. Chen, "A nonsingular helicon wave equation for a nonuniform plasma," Plasma Sources Sci. TechnoL, vol. 3, p. 602, 1994.
-
And F.F. Chen, "A Nonsingular Helicon Wave Equation for A Nonuniform Plasma," Plasma Sources Sci. TechnoL, Vol. 3
-
-
Sudit, I.D.1
|