Novel high-density plasma tool for large area flat panel display etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 3, 1996, Pages 2000-2004

  Heinrich, F ^a   Banziger U ^a   Jentzsch, A ^a   Neumann, G ^a   Huth, C ^a  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001682261     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588973     Document Type: Article

References (14)

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