Progress of an advanced diffusion source plasma reactor

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1392, Issue , 1991, Pages 95-105

  Benjamin, Neil ^a   Chapman, Brian ^a   Boswell, Rod ^a  

^a Lucas/Signatone ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IONS; SEMICONDUCTOR MATERIALS - ETCHING;

ELECTRON CYCLOTRON RESONANCE; REACTIVE ION ETCHING;

PLASMA DEVICES;

EID: 0025843212     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (0)