Fast anisotropic etching of silicon in an inductively coupled plasma reactor

Applied Physics Letters

Volumn 55, Issue 2, 1989, Pages 148-150

  Perry, A J ^a   Boswell, R W ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36549093586     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.102127     Document Type: Article

References (5)