Etching Rate Characterization of SiO2 and Si using Ion Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 11, Issue 4, 1993, Pages 1283-1288

  Ding, J ^a   Jenq, J S ^a   Kim, G H ^a   Maynard, H L ^a   Hamers, J S ^a   Hershkowitz, N ^a   Taylor, J W ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84957228602     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.578540     Document Type: Conference Paper

References (31)

1. J. W. Coburn and H. F. Winters, J. Appl. Phys. 50, 3189 (1979).
2. U. Gerlach-Meyer, J. W. Coburn, and E. Kay, Surf. Sci. 103, 177 (1981).
3. Yung-Yi Tu, T. J. Chuang, and H. F. Winters, Phys. Rev.B 23, 823 (1981).
4. T. M. Mayer, R. A. Barker, and L. J. Whitman, J. Vac. Sci. Technol. 18, 349 (1981).
5. J. D. Chinn, I. Adesida, and E. D. Wolf, Appl. Phys. Lett. 43, 185 (1983).
6. R. A. Barker, T. M. Mayer, and W. C. Pearson, J. Vac. Sci. Technol. B 1,37 (1983).
7. S. Tachi and S. Okudaira, J. Vac. Sci. Technol. B 4, 459 (1986).
8. D. C. Gray, H. H. Sawin, and J. W. Butterbaugh, J. Vac. Sci. Technol. A 9, 779 (1991).
9. J. W. Butterbaugh, D. C. Gray, and H. H. Sawin, J. Vac. Sci. Technol. B 9, 1461 (1991).
10. U. Gerlach-Meyer, Surf. Sci. 103, 524 (1981).
11. Ch. Steinbrüchel J. Electrochem. Soc. 130, 648 (1983).
12. Y. H. Lee and M.-M. Chen, J. Appl. Phys. 54, 5966 (1983).
13. R. J. Visser and C. A. M. de Vries, in Proceedings of the 8th International Symposium on Plasma Chemistry, edited by K. Akashi and A. Kinbara (IUPAC, Tokyo, 1987), p. 1029.
14. C. W. Jurgensen and A. Rammelsberg, J. Vac. Sci. Technol. A 7, 3317 (1989).
15. B. Petit and J. Pelletier, Jpn. J. Appl. Phys. 26, 825 (1987).
16. N. Hershkowitz, in Plasma Diagnostics, edited by O. Auciello and D. L. Flamm (Academic, San Diego, 1989), Vol. 1, p. 113.
17. F. F. Chen, in Plasma Diagnostic Techniques, edited by R. H. Huddlestone and S. L. Leonard (Academic, New York, 1965), p. 113.
18. J. W. Coburn and M. Chen, J. Appl. Phys. 51, 3134 (1980).
19. CRC Handbook of Chemistry and Physics, 71st ed. edited by D. R. Lide (Chemical Rubber, Boca Raton, FL, 1990), pp. 10–4, 10–30.
20. H.-J. Tiller, D. Berg, and R. Mohr, Plasma Chem. Plasma Proc. 1, 247 (1981).
21. R. A. Gottscho and T. A. Miller, Pure Appl. Chem. 56, 189 (1984).
22. J. Pelletier, Y. Arnal, and O. Joubert, Appl. Phys. Lett. 53, 1914 (1988).
23. O. Joubert, J. Pelletier, and Y. Amal, J. Appl. Phys. 65, 5096 (1989).
24. O. Joubert, J. Pelletier, C. Fiori, and, T. A. Nguyen Tan, J. Appl. Phys. 67, 4291 (1990).
25. G. S. Oehrlein and H. L. Williams, J. Appl. Phys. 62, 662 (1987).
26. M. A. Jaso and G. S. Oehrlein, J. Vac. Sci. Technol. A 6, 1397 (1988).
27. H. F. Winters and J. W. Coburn, J. Vac. Sci. Technol. B 3, 1376 (1985).
28. D. L. Flamm, V. M. Donnelly, and J. A. Mucha, J. Appl. Phys. 52, 3633 (1981).
29. M. J. Vasile and F. A. Stevie, J. Appl. Phys. 53, 3799 (1982).
30. K. Ninomiya, K. Suzuki, S. Nishimatsu, and O. Okada, J. Appl. Phys. 58, 1177 (1985).
31. T. J. Chuang, J. Chem. Phys. 74, 1461 (1981).