Polysilicon gate etching in high density plasmas. I. Process optimization using a chlorine-based chemistry

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 1, 1996, Pages 96-101

  Bell, F H ^a   Joubert, O ^a   Vallier, L ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002560086     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588441     Document Type: Article

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