Etching in a pulsed plasma

Journal of Applied Physics

Volumn 62, Issue 8, 1987, Pages 3123-3129

  Boswell, R W ^a   Porteous, R K ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36549095761     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.339362     Document Type: Article

References (10)