Discharge disruptions in a helicon plasma source

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 6, 1997, Pages 2864-2874

  Shamrai, K P ^a,b   Virko, V F ^a,b   Blom, H O ^a   Pavlenko, V P ^a   Taranov, V B ^a,b   Jonsson, L B ^a   Hedlund, C ^a   Berg, S ^a  

^a UPPSALA UNIVERSITY   (Sweden)

^b INSTITUTE FOR NUCLEAR RESEARCH   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; ELECTRIC DISCHARGES; MAGNETIC FIELD EFFECTS; MAGNETIC FIELDS; MATHEMATICAL MODELS; PLASMA DENSITY; STABILITY;

ANTENNA MATCHING; DISCHARGE DISRUPTION; ELECTROSTATIC WAVE; PLASMA IMPEDANCE; PLASMA LOAD; POWER ABSORPTION;

PLASMA SOURCES;

EID: 0031268652     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580841     Document Type: Article

References (22)

1. R. W. Boswell and D. Henry, Appl. Phys. Lett. 47, 1095 (1985).
2. N. Jiwari, T. Fukasawa, H. Kawakami, H. Shindo, and Y. Horiike, J. Vac. Sci. Technol. A 12, 1322 (1994).
3. J. Etrillo, J.-M. Francou, A. Inart, and D. Henry, Jpn. J. Appl. Phys., Part 1 33, 6005 (1994).
4. N. Jiwari, H. Iwasawa, A. Narai, H. Sakaue, H. Shindo, T. Shoji, and Y. Horiike, Jpn. J. Appl. Phys., Part 1 32, 3019 (1993).
5. T. Tsukada, H. Nogami, Y. Nakagawa, and E. Wani, Jpn. J. Appl. Phys., Part 1 33, 4433 (1994).
6. F. F. Chen, in High Density Plasma Sources, edited by O. A. Popov (Noyes Publications, Park Ridge, NJ, 1996).
7. A. J. Perry, D. Vender, and R. W. Boswell, J. Vac. Sci. Technol. B 9, 310 (1991).
8. K. P. Shamrai and V. B. Taranov, Plasma Sources Sci. Technol. 5, 474 (1996).
9. T. Shoji, Y. Sakawa, S. Nakazawa, K. Kadota, and T. Sato, Plasma Sources Sci. Technol. 2, 5 (1993).
10. A. R. Ellingboe and R. W. Boswell, Phys. Plasmas 3, 2797 (1996).
11. F. F. Chen and G. Chevalier, J. Vac. Sci. Technol. A 10, 1389 (1992).
12. G. S. Kirichenko, V. B. Taranov, K. P. Shamrai, and V. V. Yagola, Phys. Lett. A 191, 167 (1994).
13. H. Nogami, Y. Nakagawa, K. Mashimo, Y. Ogahara, and T. Tsukada, Jpn. J. Appl. Phys., Part 1 35, 2477 (1996).
14. V. P. Katyukha, G. S. Kirichenko, A. V. Rusavskii, V. B. Taranov, and K. P. Shamrai, Rev. Sci. Instrum. 65, 1368 (1994).
15. F. F. Chen, in Plasma Diagnostic Technique, edited by R. H. Huddlestone and S. L. Leonard (Academic, New York, 1965).
16. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).
17. H. Norström and H.-O. Blom, Thin Solid Films 86, 255 (1981).
18. C. Charles and R. W. Boswell, J. Vac. Sci. Technol. A 13, 2067 (1995).
19. R. W. Boswell, A. J. Perry, and M. Emani, J. Vac. Sci. Technol. A 7, 3345 (1989).
20. K. P. Shamrai and V. B. Taranov, Phys. Lett. A 204, 139 (1995).
21. F. F. Chen, Introduction to Plasma Physics and Controlled Fusion (Plenum, New York, 1984).
22. A. W. Molvik, T. D. Rognlien, J. A. Byers, R. H. Cohen, A. R. Ellingboe, E. B. Hooper, H. S. McLean, B. W. Stallard, and P. A. Vitello, J. Vac. Sci. Technol. A 14, 984 (1996).