SiO2 deposition from oxygen/silane pulsed helicon diffusion plasmas

Applied Physics Letters

Volumn 67, Issue , 1994, Pages 40-

  Charles, C ^a   Boswell, R W ^a   Kuwahara, H ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36449000558     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115485     Document Type: Article

References (7)