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Volumn 104, Issue , 2008, Pages 187-233

Magnetron sputtering of ZnO films

Author keywords

Discharge power; Magnetron sputtering; Oxygen partial pressure; Substrate temperature; Thin solid film

Indexed keywords


EID: 85072820903     PISSN: 0933033X     EISSN: 21962812     Source Type: Book Series    
DOI: 10.1007/978-3-540-73612-7_5     Document Type: Chapter
Times cited : (7)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.