Ozone in reactive gas for producing tin-doped indium oxide films by DC reactive magnetron sputtering

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 209-212

  Zahirul Alam, A H M ^a,b   Sasaki, Kimihiro ^a   Hata, Tomonobu ^a  

^a KANAZAWA UNIVERSITY   (Japan)

^b BANGLADESH UNIVERSITY OF ENGINEERING AND TECHNOLOGY   (Bangladesh)

Author keywords

Oxygen; Ozone; Sputtering

Indexed keywords

ALLOYS; ELECTRIC CONDUCTIVITY; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; OXIDATION; OXYGEN; OZONE; SPUTTER DEPOSITION; TRANSPARENCY;

DEPOSITION RATE; LOW RESISTIVITY FILM; METALLIC ALLOY; REACTIVE GAS; REACTIVE MAGNETRON SPUTTERING;

THIN FILMS;

EID: 0030217783     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08615-4     Document Type: Article

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