Free-carrier plasma resonance effects and electron transport in reactively sputtered degenerate ZnO:Al films

Thin Solid Films

Volumn 342, Issue 1, 1999, Pages 167-173

  Brehme, S ^a   Fenske, F ^a   Fuhs, W ^a   Nebauer, E ^b   Poschenrieder, M ^a   Selle, B ^a   Sieber, I ^a  

^a HAHN MEITNER INSTITUT   (Germany)

^b LEIBNIZ INSTITUT FÜR HÖCHSTFREQUENZTECHNIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; DEPOSITION; ELECTRIC VARIABLES MEASUREMENT; FILM GROWTH; GRAIN BOUNDARIES; INFRARED SPECTROSCOPY; LIGHT SCATTERING; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING ZINC COMPOUNDS;

FREE-CARRIER PLASMA RESONANCE EFFECTS;

SEMICONDUCTING FILMS;

EID: 0032686934     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01490-4     Document Type: Article

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