|
Volumn 19, Issue 2, 2001, Pages 414-419
|
Properties of aluminum-doped zinc oxide films deposited by high rate mid-frequency reactive magnetron sputtering
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ALUMINUM;
DOPING (ADDITIVES);
ELECTRIC CONDUCTIVITY MEASUREMENT;
EMISSION SPECTROSCOPY;
LIGHT EMISSION;
MAGNETRON SPUTTERING;
PLASMA APPLICATIONS;
SPUTTER DEPOSITION;
SUBSTRATES;
TRANSPARENCY;
ZINC OXIDE;
TRANSPARENT CONDUCTING OXIDE;
CONDUCTIVE FILMS;
|
EID: 0035272223
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1339019 Document Type: Article |
Times cited : (37)
|
References (28)
|