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Volumn 19, Issue 2, 2001, Pages 414-419

Properties of aluminum-doped zinc oxide films deposited by high rate mid-frequency reactive magnetron sputtering

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY MEASUREMENT; EMISSION SPECTROSCOPY; LIGHT EMISSION; MAGNETRON SPUTTERING; PLASMA APPLICATIONS; SPUTTER DEPOSITION; SUBSTRATES; TRANSPARENCY; ZINC OXIDE;

EID: 0035272223     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1339019     Document Type: Article
Times cited : (37)

References (28)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.