Dynamic simulation of process control of the reactive sputter process and experimental results

Journal of Applied Physics

Volumn 89, Issue 1, 2001, Pages 732-739

  Malkomes, N ^a   Vergohl M ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000718331     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1328407     Document Type: Article

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