New materials and deposition techniques for highly efficient silicon thin film solar cells

Solar Energy Materials and Solar Cells

Volumn 74, Issue 1-4, 2002, Pages 439-447

  Rech, B ^a   Kluth, O ^a   Repmann, T ^a   Roschek, T ^a   Springer, J ^a   Muller J ^a   Finger, F ^a   Stiebig, H ^a   Wagner, H ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

A Si; High rate; Light trapping; PECVD; Silicon; Sputtering; Tandem cell; TCO; Thin film solar cell; Up scaling; Zinc oxide; c Si

Indexed keywords

AMORPHOUS SILICON; CRYSTALLINE MATERIALS; ETCHING; FILM GROWTH; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPUTTER DEPOSITION; SURFACE STRUCTURE; TEXTURES; THIN FILMS; ZINC OXIDE;

LIGHT TRAPPING; TANDEM CELLS;

SILICON SOLAR CELLS;

EID: 0036778583     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(02)00114-9     Document Type: Article

References (16)