Deposition of TCO films by reactive magnetron sputtering from metallic Zn:Al alloy targets

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 512-516

  May, Christian ^a   Menner, Richard ^b   Strümpfel, Johannes ^a   Oertel, Mike ^b   Sprecher, Bernd ^c  

^a Von Ardenne Anlagentechnik GmbH   (Germany)

^b ZENTRUM FÜR SONNENENERGIE UND WASSERSTOFF FORSCHUNG BADEN WÜRTTEMBERG ZSW   (Germany)

^c Wurth Solar GmbH and Co KG   (Germany)

Author keywords

Reactive sputtering; Thin film solar cell; Transparent conductive oxide; Zinc aluminum oxide

Indexed keywords

ALUMINUM; DOPING (ADDITIVES); MAGNETRON SPUTTERING; THIN FILMS;

PLASMA EMISSION MONITORING (PEM);

ZINC OXIDE;

ALUMINUM; COATING; DEPOSITION; FILM; SPUTTERING; SURFACE TREATMENT; ZINC;

EID: 0038807418     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00161-0     Document Type: Article

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