Process stabilisation for large area reactive MF-sputtering of Al-doped ZnO

Thin Solid Films

Volumn 502, Issue 1-2, 2006, Pages 44-49

  Ruske, F ^a   Pflug, A ^a   Sittinger, V ^a   Werner, W ^a   Szyszka, B ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

Process control; Sputtering; Zinc oxide

Indexed keywords

ALUMINUM; CONTROL SYSTEM ANALYSIS; DOPING (ADDITIVES); PARTIAL PRESSURE; SPUTTERING;

CLOSED LOOP CONTROL; FILM PROPERTIES; FILM THICKNESS; OPTICAL PERFORMANCE;

ZINC OXIDE;

EID: 33344470195     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.232     Document Type: Conference Paper

References (7)

1. B. Szyszka, V. Sittinger, X. Jiang, R.J. Hong, W. Werner, A. Pflug, M. Ruske, and A. Lopp Thin Solid Films 442 2003 179
2. J. Müller, G. Schöpe, O. Kluth, B. Rech, B. Szyszka, V. Sittinger, R. Geyer, P. Lechner, H. Schade, M. Ruske, G. Dittmar, and H.-P. Bochem Thin Solid Films 442 2003 158
3. A. Pflug, B. Szyszka, V. Sittinger, and J. Niemann Society of Vacuum Coaters, 46th Conference Proceedings 2003 241
4. J. Bruch Precisions Nov. 2001, Applied Films 2001 Download: http://www.appliedfilms.com/precision3/contents.htm
5. A. Pflug, B. Szyszka, and J. Niemann Thin Solid Films 442 2003 21
6. V. Sittinger, A. Kampmann, M. Schubert, K. Oehlstrom, and R. Reineke-Koch Proceedings 16th European Photovoltaic Solar Energy Conference 2000 Glasgow
7. A. Pflug, B. Szyszka, M. Geisler, A. Kastner, C. Braatz, U. Schreiber, and J. Bruch Society of Vacuum Coaters, 47th Conference Proceedings 2004 155