Large area deposition of transparent and conductive ZnO:Al layers by reactive mid frequency magnetron sputtering

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2001, Pages 272-276

  Szyszka, B ^a   Hoing T ^a   Jiang, X ^a   Bierhals, A ^a   Malkomes, N ^a   Vergohl M ^a   Sittinger, V ^a   Bringmann, U ^a   Brauer G ^a  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

Author keywords

(Zn, Al)O; In line process; Reactive deposition; Transparent conductive coatings

Indexed keywords

ALUMINUM; ATOMIC FORCE MICROSCOPY; ELECTRODES; ELLIPSOMETRY; GLASS; HALL EFFECT; INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING; SOLAR CELLS; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION ANALYSIS;

OPTICAL SPECTROSCOPY; REACTIVE MID FREQUENCY (MF) MAGNETRON SPUTTERING;

ZINC OXIDE;

EID: 0035215324     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)