Review of the fundamentals of thin-film growth

Applied Optics

Volumn 41, Issue 16, 2002, Pages 3053-3060

  Kaiser, Norbert ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COALESCENCE; DEPOSITION; DIELECTRIC FILMS; ENERGY GAP; FILM GROWTH; METALLIC FILMS; NUCLEATION; OPTICAL PROPERTIES; THERMAL EFFECTS;

THIN-FILM STRUCTURES;

THIN FILMS;

EID: 0036603503     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.41.003053     Document Type: Article

References (35)

1. G. Hass, “Struktur und Optik aufgedampfter Metallschichten,” (“Structure and Optics of evaporated metal films”), Ann. Phys. (Leipzig) 31, 245-260 (1938).
2. D. E. Aspnes, “Optical properties of thin films,” Thin Solid Films 89, 249-262 (1982).
3. K. H. Guenther, D. J. Smith, and L. Bangjun, “Structure and related properties of thin film optical coatings,” in Optical Thin Films II: New Developments, R. I. Seddon, ed., Proc. SPIE 678, 2-11 (1986).
4. H. A. Macleod, Performance-limiting factors in optical coatings, in Los Angeles Conference on Optics’81, D. H. Liebenberg, ed., Proc. SPIE 288, 580-586 (1981).
5. H. A. Macleod, “Microstructure of optical thin films,” in Optical Thin Films, R. I. Seddon, ed., Proc. SPIE 325, 21-29 (1982).
6. M. Ohring, The Material Science ofThin Films (Academic, San Diego, Calif., 1992).
7. H. K. Pulker, Coatings on Glass (Elsevier, Amsterdam, 1999).
8. J. Venables, Introduction to Surfaces and Thin Film Processes (Cambridge U. Press, Cambridge, UK, 2000).
9. E. Bauer, “Wachstum dunner Schicten,” Z. Kristallogr. 110, 372-394 (1958).
10. I. Markov and R. Kaischew, “Einfluss von Substratinhomoge-nitaten auf die Kinetik der heterogenen Keimbildung,” Krist. Tech. 11, 685-692 (1976).
11. B. A. Movchan and A. V. Demchishin, “Rost i struktura tonkich tverdotelnych plenok,” Phys. Met. Metallogr. 28, 83-91 (1969).
12. J. A. Thornton, “Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings,” J. Vac. Sci. Technol. 11, 666-672 (1974).
13. J. A. Thornton, “Structure and topography of sputtered coatings,” Annu. Rev. Mater. Sci. 7, 239-260 (1977).
14. J. A. Thornton, “Study of the microstructure of thick sputtered coatings,” Thin Solid Films 40, 335-342 (1977).
15. J. A. Thornton, “The microstructure of sputter-deposited coatings,” J. Vac. Sci. Technol. A 4, 3059-3065 (1986).
16. R. Messier, A. P. Giri, and R. A. Roy, “Revised structure zone model for thin film physical structure,” J. Vac. Sci. Technol. A 2, 500-503 (1984).
17. R. Messier, “Toward quantification of thin film morphology,” J. Vac. Sci. Technol. A 4/3, 490 -495 (1986).
18. C. R. M. Grovenor, H. T. G. Hentzell, and D. A. Smith, “The development of grain structure during growth of metallic films,” Acta Metall. 32, 773-781 (1984).
19. P. B. Barna and M. Adamik, “Growth mechanisms of polycrystalline thin films,” in Science and Technology of Thin Films, in F. C. Matacotta and G. Ottaviani, eds. (World Scientific, Singapore, 1995), pp. 1-28.
20. 2films prepared by reactive evaporation,” Thin Solid Films 371, 218 -224 (2000).
21. I. Hodgkinson and Q. Wu, Birefringent Thin Film Polarizing Elements (World Scientific, Singapore, 1999).
22. I. Hodgkinson, A. Lakhtakia, and Q. Wu, “Experimental realization of sculptured-thin-film polarization-discriminatory light-handedness inverters,” Opt. Eng. 39, 2831-2834 (2000).
23. P. S. Kirejew, Physik der Halbleiter (Akademie-Verlag, Berlin, 1974), Chap. 2, p. 470.
24. A. Duparre, “Light scattering of thin dielectric films,” in Thin Films for Optical Coatings, R. E. Hummel and K. H. Guenther, eds., Vol. 1 of Handbook of Optical Properties (CRC Press, Boca Raton, Fla., 1995), pp. 273-304.
25. C. von Fragstein and H. Romer, “Uber die Anomalie der optischen Konstanten,” Z. Phys. 151, 54-71 (1958).
26. U. Kreibig and M. Vollmer, eds., Optical Properties of Metal Clusters (Springer-Verlag, Berlin, 1995).
27. H. Monard, “Optical properties of silver, gold and aluminium ultra thin granular films evaporated on oxidized aluminium,” Thin Solid Films 310, 265-273 (1997).
28. O. Stenzel, A. N. Lebedev, M. Schreiber, and D. R. T. Zahn, “Simulation of linear optical losses of absorbing heterogeneous thin solid films,” Thin Solid Films 372, 200-208 (2000).
29. L. T. Vinh, V. Yam, Y. Zeng, and D. Bouchier, “Nucleation and growth of self-assembled Ge/Si (001) quantum dots in single and stacked layers,” Thin Solid Films 380, 2-9 (2000).
30. R. J. Hill and S. J. Nadel, Coated Glass Applications and Markets (BOC Coating Technology, Fairfield, Calif., 1999).
31. H. J. Glaser, Dunnfilmtechnologie auf Flachglas (Verlag Karl Hofmann, Schorndorf, Germany, 1999).
32. W. Ensinger, “Low energy ion assist during deposition—an effective tool for controlling thin film microstructure,” Nucl. Instrum. Methods Phys. Res. B 127/128, 796-808 (1997).
33. R. Dannenberg, E. A. Stach, J. R. Groza, and B. J. Dresser, “In-situ TEM observations of abnormal grain growth, coarsening, and substrate de-wetting in nanocrystalline Ag thin films,” Thin Solid Films 370, 54-62 (2000).
34. S. Yulin, T. Feigl, T. Kuhlmann, and N. Kaiser, “Damage resistant and low stress EUV multilayer mirrors,” in Emerging Lithographic Technologies, E. A. Dabisz, ed., Proc. SPIE 4343, 607- 614 (2001).
35. T. Kuhlmann, S. Yulin, T. Feigl, N. Kaiser, T. Gorelik, U. Kaiser, and W. Richter, “Chromium-scandium mirrors for the nitrogen Ka-line in the water window,” Appl. Opt. 41, 2048-2052 (2002).