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Volumn 19, Issue 5, 2001, Pages 2368-2372
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Nonclassical impedance control of the high rate midfrequency reactive magnetron sputter process using harmonic analysis
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRIC CURRENTS;
ELECTRIC IMPEDANCE;
ELECTRIC POTENTIAL;
ELLIPSOMETRY;
FREQUENCIES;
HARMONIC ANALYSIS;
HYSTERESIS;
OPTICAL PROPERTIES;
OXYGEN;
PARTIAL PRESSURE;
MIDFREQUENCY (MF) REACTIVE SPUTTER PROCESS;
NONCLASSICAL IMPEDANCE CONTROL;
SPUTTER DEPOSITION;
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EID: 0035441754
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1385909 Document Type: Article |
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Times cited : (3)
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References (19)
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