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Surface and Coatings Technology

Volumn 98, Issue 1-3, 1998, Pages 1304-1314

Comparison of transparent conductive oxide thin films prepared by a.c. and d.c. reactive magnetron sputtering

(4) Jager S a Szyszka, B a Szczyrbowski, J b Brauer G b

a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST (Germany)

b EVONIK INDUSTRIES AG (Germany)

Author keywords

AC reactive magnetron sputtering; Optical coatings; Transparent conductors; Zinc oxide

Indexed keywords

EID: 0037848197 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(97)00145-X Document Type: Article

Times cited : (166)

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