High-rate deposition of MgO by reactive ac pulsed magnetron sputtering in the transition mode

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 1, 2006, Pages 106-113

  Kupfer, H ^a   Kleinhempel, R ^a   Richter, F ^a   Peters, C ^b   Krause, U ^b   Kopte, T ^b   Cheng, Y ^c  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^b Fraunhofer Institute for Electron Beam and Plasma Technology   (Germany)

^c University of Texas at Arlington   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNESIUM RADIATION; OXIDE MODE; OXYGEN FLOW;

CLOSED LOOP CONTROL SYSTEMS; ELECTRON EMISSION; MAGNETRON SPUTTERING; OXYGEN; PLASMA ETCHING; X RAY DIFFRACTION ANALYSIS;

MAGNESIA;

EID: 29344474029     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2138717     Document Type: Article

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