Hydrogen doping of DC sputtered ZnO:Al films from novel target material

Surface and Coatings Technology

Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 236-240

  Ruske, Florian ^a   Sittinger, V ^a   Werner, W ^a   Szyszka, B ^a   van Osten, K U ^b   Dietrich, K ^b   Rix, R ^b  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^b GfE Metalle und Materialien GmbH   (Germany)

Author keywords

Electrical properties; Hydrogen; Optical properties; Sputtering; Zinc oxide

Indexed keywords

ALUMINUM; CERAMIC MATERIALS; COMPOSITION EFFECTS; CONDUCTIVE MATERIALS; DOPING (ADDITIVES); ELECTRIC PROPERTIES; FILMS; HYDROGEN; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

ALUMINUM DOPED ZINC OXIDE LAYERS; HYDROGEN DOPING; NOVEL TARGET MATERIAL; SPUTTERED FILMS;

ZINC OXIDE;

ELECTRICAL PROPERTY;

EID: 24644489134     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.01.019     Document Type: Article

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