Desorption of Zn from a growing ZnO:Al-film deposited by magnetron sputtering

Surface and Coatings Technology

Volumn 93, Issue 1, 1997, Pages 27-31

  Wendt, R ^a,b   Ellmer, K ^a  

^a HAHN MEITNER INSTITUT   (Germany)

^b Inst F Niedertemperatur P   (Germany)

Author keywords

Magnetron sputtering; Stoichometry; Substrate potential; ZnO:Al film

Indexed keywords

ALUMINUM; DESORPTION; ELECTRONS; FILM GROWTH; HEATING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; STOICHIOMETRY; SUBSTRATES; ZINC; ZINC OXIDE;

ELECTRON BOMBARDMENT; ION ENERGY DISTRIBUTIONS; PLASMA MONITORING SYSTEMS;

MAGNETRON SPUTTERING;

EID: 0031200623     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00036-4     Document Type: Article

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