-
1
-
-
84872708504
-
Low-k materials: Recent advances
-
edited by M. Baklanov, P. S. Ho: E. Zschech (John Wiley Sons, Ltd., Chichester, UK), Cha.
-
G. Dubois and W. Volksen, " Low-k materials: Recent advances.," in Advanced Interconnects for ULSI Technology, edited by, M. Baklanov, P. S. Ho,:, E. Zschech, (John Wiley Sons, Ltd., Chichester, UK, 2012), Chap..
-
(2012)
Advanced Interconnects for ULSI Technology
-
-
Dubois, G.1
Volksen, W.2
-
3
-
-
84950317098
-
Spin-on dielectric materials
-
edited by M. Baklanov, M. Green, and K. Maex (John Wiley Sons, Ltd., Chichester, UK), Cha.
-
G. Dubois, R. D. Miller, W. Volksen, " Spin-on dielectric materials.," in Dielectric Films for Advanced Microelectronics, edited by, M. Baklanov, M. Green, and, K. Maex, (John Wiley Sons, Ltd., Chichester, UK, 2007), Chap..
-
(2007)
Dielectric Films for Advanced Microelectronics
-
-
Dubois, G.1
Miller, R.D.2
Volksen, W.3
-
4
-
-
0033569683
-
-
10.1126/science.286.5439.421
-
R. D. Miller, Science 286, 421 (1999). 10.1126/science.286.5439.421
-
(1999)
Science
, vol.286
, pp. 421
-
-
Miller, R.D.1
-
5
-
-
0037666297
-
-
10.1063/1.1567460
-
K. Maex, M. R. Baklanov, D. Shamiryan, F. Lacopi, S. H. Brongersma, and Z. S. Yanovitskaya, J. Appl. Phys. 3, 8793 (2003). 10.1063/1.1567460
-
(2003)
J. Appl. Phys.
, vol.3
, pp. 8793
-
-
Maex, K.1
Baklanov, M.R.2
Shamiryan, D.3
Lacopi, F.4
Brongersma, S.H.5
Yanovitskaya, Z.S.6
-
6
-
-
0142011574
-
-
10.1016/S0167-9317(03)00381-2
-
Y. Furukawa, M. Patz, T. Kokubo, and J. H. M. Snijders, Microelecron. Eng. 70.2-4, 267 (2003). 10.1016/S0167-9317(03)00381-2
-
(2003)
Microelecron. Eng.
, vol.7024
, pp. 267
-
-
Furukawa, Y.1
Patz, M.2
Kokubo, T.3
Snijders, J.H.M.4
-
7
-
-
31144461878
-
-
10.1116/1.1861038
-
M. A. Worsley, S. F. Bent, S. M. Gates, N. C. M. Fuller, W. Volksen, M. Steen, and T. Dalton, J. Vac. Sci. Technol. B 23, 395 (2005). 10.1116/1.1861038
-
(2005)
J. Vac. Sci. Technol. B
, vol.23
, pp. 395
-
-
Worsley, M.A.1
Bent, S.F.2
Gates, S.M.3
Fuller, N.C.M.4
Volksen, W.5
Steen, M.6
Dalton, T.7
-
8
-
-
33744902330
-
-
10.1116/1.2194947
-
X. Hua, J. Vac. Sci. Technol. B 24, 1238 (2006). 10.1116/1.2194947
-
(2006)
J. Vac. Sci. Technol. B
, vol.24
, pp. 1238
-
-
Hua, X.1
-
9
-
-
27144505201
-
-
10.1116/1.1821584
-
X. Hua, C. Stolz, G. S. Oehrlein, P. Lazzeri, N. Coghe, M. Anderle, C. K. Inoki, T. S. Kuan, and P. Jiang, J. Vac. Sci. Technol. A 23, 151 (2005). 10.1116/1.1821584
-
(2005)
J. Vac. Sci. Technol. A
, vol.23
, pp. 151
-
-
Hua, X.1
Stolz, C.2
Oehrlein, G.S.3
Lazzeri, P.4
Coghe, N.5
Anderle, M.6
Inoki, C.K.7
Kuan, T.S.8
Jiang, P.9
-
10
-
-
33846909446
-
-
10.1016/j.mee.2006.10.058
-
O. Richard, F. Iacopi, H. Bender, and G. Beyer, Microelectron. Eng. 84, 517 (2007). 10.1016/j.mee.2006.10.058
-
(2007)
Microelectron. Eng.
, vol.84
, pp. 517
-
-
Richard, O.1
Iacopi, F.2
Bender, H.3
Beyer, G.4
-
11
-
-
13244254189
-
-
10.1116/1.1815316
-
N. Posseme, T. Chevolleau, O. Joubert, L. Vallier, and N. Rochat, J. Vac. Sci. Technol. B 22, 2772 (2004). 10.1116/1.1815316
-
(2004)
J. Vac. Sci. Technol. B
, vol.22
, pp. 2772
-
-
Posseme, N.1
Chevolleau, T.2
Joubert, O.3
Vallier, L.4
Rochat, N.5
-
12
-
-
0442295437
-
-
10.1007/BF02706948
-
S.-W. Hwang, G.-R. Lee, J.-H. Min, and S. H. Moon, Korean J. Chem. Eng. 20, 1131 (2003). 10.1007/BF02706948
-
(2003)
Korean J. Chem. Eng.
, vol.20
, pp. 1131
-
-
Hwang, S.-W.1
Lee, G.-R.2
Min, J.-H.3
Moon, S.H.4
-
13
-
-
77950589110
-
-
10.1116/1.3308623
-
M.-S. Kuo, X. Hua, G. S. Oehrlein, A. Ali, P. Jiang, P. Lazzeri, and M. Anderle, J. Vac. Sci. Technol. B 28, 284 (2010). 10.1116/1.3308623
-
(2010)
J. Vac. Sci. Technol. B
, vol.28
, pp. 284
-
-
Kuo, M.-S.1
Hua, X.2
Oehrlein, G.S.3
Ali, A.4
Jiang, P.5
Lazzeri, P.6
Anderle, M.7
-
14
-
-
38849193537
-
-
10.1116/1.2834562
-
J. Bao, H. Shi, J. Liu, H. Huang, P. S. Ho, M. D. Goodner, M. Moinpour, and G. M. Kloster, J. Vac. Sci. Technol. B 26, 219 (2008). 10.1116/1.2834562
-
(2008)
J. Vac. Sci. Technol. B
, vol.26
, pp. 219
-
-
Bao, J.1
Shi, H.2
Liu, J.3
Huang, H.4
Ho, P.S.5
Goodner, M.D.6
Moinpour, M.7
Kloster, G.M.8
-
15
-
-
31144458276
-
-
10.1116/1.1943439
-
P. Lazzeri, X. Hua, G. S. Oehrlein, M. Barozzi, E. Iacob, and M. Anderle, J. Vac. Sci. Technol. B 23, 1491 (2005). 10.1116/1.1943439
-
(2005)
J. Vac. Sci. Technol. B
, vol.23
, pp. 1491
-
-
Lazzeri, P.1
Hua, X.2
Oehrlein, G.S.3
Barozzi, M.4
Iacob, E.5
Anderle, M.6
-
16
-
-
37149039506
-
-
10.1116/1.2804615
-
N. Posseme, T. Chevolleau, T. David, M. Darnon, O. Louveau, and O. Joubert, J. Vac. Sci. Technol. B 25, 1928 (2007). 10.1116/1.2804615
-
(2007)
J. Vac. Sci. Technol. B
, vol.25
, pp. 1928
-
-
Posseme, N.1
Chevolleau, T.2
David, T.3
Darnon, M.4
Louveau, O.5
Joubert, O.6
-
17
-
-
4944235442
-
-
10.1149/1.1775973
-
Q. T. Le, C. M. Whelan, H. Struyf, H. Bender, T. Conard, S. H. Brongersma, W. Boullart, S. Vanhaelemeersch, and K. Maex, Electrochem. Solid-State Lett. 7, F49 (2004). 10.1149/1.1775973
-
(2004)
Electrochem. Solid-State Lett.
, vol.7
, pp. 49
-
-
Le, Q.T.1
Whelan, C.M.2
Struyf, H.3
Bender, H.4
Conard, T.5
Brongersma, S.H.6
Boullart, W.7
Vanhaelemeersch, S.8
Maex, K.9
-
18
-
-
79952489298
-
-
10.1016/j.mee.2010.07.014
-
E. Kunnen, G. T. Barkema, C. Maes, D. Shamiryan, A. Urbanowicz, H. Struyf, and M. R. Baklanov, Microelectron. Eng. 88, 631 (2011). 10.1016/j.mee.2010.07.014
-
(2011)
Microelectron. Eng.
, vol.88
, pp. 631
-
-
Kunnen, E.1
Barkema, G.T.2
Maes, C.3
Shamiryan, D.4
Urbanowicz, A.5
Struyf, H.6
Baklanov, M.R.7
-
19
-
-
2142704413
-
-
10.1143/JJAP.43.498
-
H. Miyoshi, H. Matsuo, Y. Oku, H. Tanaka, K. Yamada, N. Mikami, S. Takada, N. Hata, and T. Kikkawa, Jpn. J. Appl. Phys., Part 1 43, 498 (2004). 10.1143/JJAP.43.498
-
(2004)
Jpn. J. Appl. Phys., Part 1
, vol.43
, pp. 498
-
-
Miyoshi, H.1
Matsuo, H.2
Oku, Y.3
Tanaka, H.4
Yamada, K.5
Mikami, N.6
Takada, S.7
Hata, N.8
Kikkawa, T.9
-
21
-
-
0141566457
-
-
10.1023/A:1024944316369
-
J. B. Vella, I. S. Adhihetty, K. Junker, and A. A. Volinsky, Int. J. Fract. 120, 487 (2002). 10.1023/A:1024944316369
-
(2002)
Int. J. Fract.
, vol.120
, pp. 487
-
-
Vella, J.B.1
Adhihetty, I.S.2
Junker, K.3
Volinsky, A.A.4
-
22
-
-
0347601892
-
-
10.1016/j.mee.2003.11.006
-
L. Shen and K. Zeng, Microelectron. Eng. 71, 221 (2004). 10.1016/j.mee.2003.11.006
-
(2004)
Microelectron. Eng.
, vol.71
, pp. 221
-
-
Shen, L.1
Zeng, K.2
-
23
-
-
77956916668
-
-
10.1002/adfm.201000558
-
M. S. Oliver, G. Dubois, M. Sherwood, D. M. Gage, and R. H. Dauskardt, Adv. Funct. Mater. 20, 2884 (2010). 10.1002/adfm.201000558
-
(2010)
Adv. Funct. Mater.
, vol.20
, pp. 2884
-
-
Oliver, M.S.1
Dubois, G.2
Sherwood, M.3
Gage, D.M.4
Dauskardt, R.H.5
-
24
-
-
85067754350
-
-
Dresden, Germany, 12-14 April, 11th ed.
-
A. Urbanowicz, K. Vanstreels, P. Verdonck, D. Shamiryan, S. De Gendt, and M. R. Baklanov, International Workshop on Stress-Induced Phenomena in Metallization Dresden, Germany, 12-14 April 2010, 11th ed.
-
(2010)
International Workshop on Stress-Induced Phenomena in Metallization
-
-
Urbanowicz, A.1
Vanstreels, K.2
Verdonck, P.3
Shamiryan, D.4
De Gendt, S.5
Baklanov, M.R.6
-
25
-
-
51149107395
-
-
IITC 2008, International. 10.1109/IITC.2008.4546963
-
S. V. Nitta, D. Edelstein, S. Ponoth, L. Clevenger, X. Liu, and T. Standaert, Interconnect Technology Conference, IITC 2008, International. 10.1109/IITC.2008.4546963
-
Interconnect Technology Conference
-
-
Nitta, S.V.1
Edelstein, D.2
Ponoth, S.3
Clevenger, L.4
Liu, X.5
Standaert, T.6
-
26
-
-
79958053613
-
-
10.1016/j.mee.2011.03.006
-
M. Pantouvaki, Microelectron. Eng. 88, 1618 (2011). 10.1016/j.mee.2011. 03.006
-
(2011)
Microelectron. Eng.
, vol.88
, pp. 1618
-
-
Pantouvaki, M.1
-
27
-
-
33751236207
-
-
10.1016/j.mee.2006.10.021
-
F. Gaillard, Microelectron. Eng. 83, 2309 (2006). 10.1016/j.mee.2006.10. 021
-
(2006)
Microelectron. Eng.
, vol.83
, pp. 2309
-
-
Gaillard, F.1
-
29
-
-
34249865340
-
-
10.1116/1.2723756
-
D. Eon, M. Darnon, T. Chevolleau, T. David, L. Vallier, and O. Joubert, J. Vac. Sci. Technol. B 25, 715 (2007). 10.1116/1.2723756
-
(2007)
J. Vac. Sci. Technol. B
, vol.25
, pp. 715
-
-
Eon, D.1
Darnon, M.2
Chevolleau, T.3
David, T.4
Vallier, L.5
Joubert, O.6
-
30
-
-
57249105045
-
-
10.1116/1.3006021
-
M. Darnon, T. Chevolleau, T. David, N. Posseme, J. Ducote, C. Licitra, L. Vallier, O. Joubert, and J. Torres, J. Vac. Sci. Technol. B 26, 1964 (2008). 10.1116/1.3006021
-
(2008)
J. Vac. Sci. Technol. B
, vol.26
, pp. 1964
-
-
Darnon, M.1
Chevolleau, T.2
David, T.3
Posseme, N.4
Ducote, J.5
Licitra, C.6
Vallier, L.7
Joubert, O.8
Torres, J.9
-
32
-
-
84866856269
-
-
European patent EP2272996A1 (12 January).
-
A. Urbanowicz, P. Verdonck, S. Shamiryan, K. Vanstraels, M. R. Baklanov, and S. De Gendt, " Fabrication of porogen residue free and mechanically robust low-k materials.," European patent EP2272996A1 (12 January 2011).
-
(2011)
Fabrication of Porogen Residue Free and Mechanically Robust Low-k Materials
-
-
Urbanowicz, A.1
Verdonck, P.2
Shamiryan, S.3
Vanstraels, K.4
Baklanov, M.R.5
De Gendt, S.6
-
33
-
-
85067744414
-
-
15-16 March, Grenoble, France, 2012.
-
J.-F. de Marneffe, R. Ljazouli, L. Souriau, L. Zhang, C. Wilson, and M. R. Baklanov, PESM2012, 15-16 March 2012, Grenoble, France, 2012, www.pesm.eu.
-
(2012)
PESM2012
-
-
De Marneffe, J.-F.1
Ljazouli, R.2
Souriau, L.3
Zhang, L.4
Wilson, C.5
Baklanov, M.R.6
-
34
-
-
84863912713
-
-
10.1002/adfm.201200152
-
T. Frot, W. Volksen, S. Purushothaman, R. L. Bruce, T. Magbitang, D. C. Miller, V. R. Deline, and G. Dubois, Adv. Funct. Mater. 22, 3043 (2012). 10.1002/adfm.201200152
-
(2012)
Adv. Funct. Mater.
, vol.22
, pp. 3043
-
-
Frot, T.1
Volksen, W.2
Purushothaman, S.3
Bruce, R.L.4
Magbitang, T.5
Miller, D.C.6
Deline, V.R.7
Dubois, G.8
-
35
-
-
79959935822
-
-
10.1002/adma.201100569
-
T. Frot, W. Volksen, S. Purushothaman, R. L. Bruce, and G. Dubois, Adv. Mater. 23, 2828 (2012). 10.1002/adma.201100569
-
(2012)
Adv. Mater.
, vol.23
, pp. 2828
-
-
Frot, T.1
Volksen, W.2
Purushothaman, S.3
Bruce, R.L.4
Dubois, G.5
-
36
-
-
85067758237
-
Symposium O: Materials, processes, and reliability for advanced interconnects for micro- and nanoelectronics
-
26-29 April, San Francisco, CA, Abstract O1.3.
-
W. Volksen, " Symposium O: Materials, processes, and reliability for advanced interconnects for micro- and nanoelectronics.," in MRS Spring Meeting 2011, 26-29 April 2011, San Francisco, CA, Abstract O1.3.
-
(2011)
MRS Spring Meeting 2011
-
-
Volksen, W.1
-
37
-
-
51949105414
-
-
10.1007/s10971-008-1776-2
-
G. Dubois, W. Volksen, T. Magbitang, M. H. Sherwood, R. D. Miller, D. M. Gage, and R. Dauskardt, J. Sol-Gel Sci. Technol. 48, 187 (2008). 10.1007/s10971-008-1776-2
-
(2008)
J. Sol-Gel Sci. Technol.
, vol.48
, pp. 187
-
-
Dubois, G.1
Volksen, W.2
Magbitang, T.3
Sherwood, M.H.4
Miller, R.D.5
Gage, D.M.6
Dauskardt, R.7
-
38
-
-
36549062079
-
-
10.1002/adma.200701193
-
G. Dubois, W. Volksen, T. Magbitang, R. D. Miller, D. M. Gage, and R. Dauskardt, Adv. Mater. 19, 3989 (2007). 10.1002/adma.200701193
-
(2007)
Adv. Mater.
, vol.19
, pp. 3989
-
-
Dubois, G.1
Volksen, W.2
Magbitang, T.3
Miller, R.D.4
Gage, D.M.5
Dauskardt, R.6
-
39
-
-
69549086541
-
-
10.1149/1.3186029
-
S. M. Gates, G. Dubois, E. T. Ryan, A. Grill, M. Liu, and D. Gidley, J. Electro Chem. Soc. 156, G156 (2009). 10.1149/1.3186029
-
(2009)
J. Electro Chem. Soc.
, vol.156
, pp. 156
-
-
Gates, S.M.1
Dubois, G.2
Ryan, E.T.3
Grill, A.4
Liu, M.5
Gidley, D.6
-
40
-
-
33750525318
-
-
10.1016/j.apsusc.2006.05.123
-
C. Wyon, J. P. Gonchond, D. Delille, A. Michallet, J. C. Royer, L. Kwakman, and S. Marthon, Appl. Surf. Sci. 253, 21 (2006). 10.1016/j.apsusc.2006. 05.123
-
(2006)
Appl. Surf. Sci.
, vol.253
, pp. 21
-
-
Wyon, C.1
Gonchond, J.P.2
Delille, D.3
Michallet, A.4
Royer, J.C.5
Kwakman, L.6
Marthon, S.7
-
41
-
-
0042028160
-
-
10.1016/S0022-3093(03)00321-1
-
D. Rebiscoul, A. Van der Lee, P. Frugier, A. Ayral, and S. Gin, J. Non-Cryst. Solids 325, 113 (2003). 10.1016/S0022-3093(03)00321-1
-
(2003)
J. Non-Cryst. Solids
, vol.325
, pp. 113
-
-
Rebiscoul, D.1
Van Der Lee, A.2
Frugier, P.3
Ayral, A.4
Gin, S.5
-
42
-
-
3743070568
-
-
10.1021/la960189l
-
J. Tamayo and R. Garca, Langmuir 12, 4430 (1996). 10.1021/la960189l
-
(1996)
Langmuir
, vol.12
, pp. 4430
-
-
Tamayo, J.1
Garca, R.2
-
43
-
-
77955225051
-
-
10.1063/1.3446820
-
F. Bailly, T. David, T. Chevolleau, M. Darnon, N. Posseme, R. Bouyssou, J. Ducote, O. Joubert, and C. Cardinaud, J. Appl. Phys. 108, 014906 (2010). 10.1063/1.3446820
-
(2010)
J. Appl. Phys.
, vol.108
, pp. 014906
-
-
Bailly, F.1
David, T.2
Chevolleau, T.3
Darnon, M.4
Posseme, N.5
Bouyssou, R.6
Ducote, J.7
Joubert, O.8
Cardinaud, C.9
-
45
-
-
31144441052
-
-
10.1116/1.2008272
-
E. Pargon, M. Darnon, O. Joubert, T. Chevolleau, L. Vallier, L. Mollard, and T. Lill, J. Vac. Sci. Technol. B 23, 1913 (2005). 10.1116/1.2008272
-
(2005)
J. Vac. Sci. Technol. B
, vol.23
, pp. 1913
-
-
Pargon, E.1
Darnon, M.2
Joubert, O.3
Chevolleau, T.4
Vallier, L.5
Mollard, L.6
Lill, T.7
-
47
-
-
48949122214
-
-
10.1002/pssc.200777776
-
C. Licitra, F. Bertin, M. Darnon, T. Chevolleau, C. Guedj, S. Cetre, H. Fontaine, A. Zenasni, and L. L. Chapelon, Phys. Status Solidi C 5, 1278 (2008). 10.1002/pssc.200777776
-
(2008)
Phys. Status Solidi C
, vol.5
, pp. 1278
-
-
Licitra, C.1
Bertin, F.2
Darnon, M.3
Chevolleau, T.4
Guedj, C.5
Cetre, S.6
Fontaine, H.7
Zenasni, A.8
Chapelon, L.L.9
-
48
-
-
77955661581
-
-
10.1016/j.tsf.2010.03.015
-
C. Licitra, R. Bouyssou, T. Chevolleau, and F. Bertina, Thin Solid Films 518, 5140 (2010). 10.1016/j.tsf.2010.03.015
-
(2010)
Thin Solid Films
, vol.518
, pp. 5140
-
-
Licitra, C.1
Bouyssou, R.2
Chevolleau, T.3
Bertina, F.4
-
50
-
-
22544475043
-
-
10.1007/s10934-005-6768-9
-
P. Revol, D. Perret, F. Bertin, F. Fusalba, V. Rouessac, A. Chabli, and G. Passemard, J. Porous Mater. 12, 113 (2005). 10.1007/s10934-005-6768-9
-
(2005)
J. Porous Mater.
, vol.12
, pp. 113
-
-
Revol, P.1
Perret, D.2
Bertin, F.3
Fusalba, F.4
Rouessac, V.5
Chabli, A.6
Passemard, G.7
-
52
-
-
0942267561
-
-
10.1116/1.1627337
-
N. Posseme, T. Chevolleau, O. Joubert, L. Vallier, and P. Mangiagalli, J. Vac. Sci. Technol. B 21, 2432 (2003). 10.1116/1.1627337
-
(2003)
J. Vac. Sci. Technol. B
, vol.21
, pp. 2432
-
-
Posseme, N.1
Chevolleau, T.2
Joubert, O.3
Vallier, L.4
Mangiagalli, P.5
-
53
-
-
34249875953
-
-
10.1116/1.2738482
-
T. Chevolleau, M. Darnon, T. David, N. Posseme, J. Torres, and O. Joubert, J. Vac. Sci. Technol. B 25, 886 (2007). 10.1116/1.2738482
-
(2007)
J. Vac. Sci. Technol. B
, vol.25
, pp. 886
-
-
Chevolleau, T.1
Darnon, M.2
David, T.3
Posseme, N.4
Torres, J.5
Joubert, O.6
-
54
-
-
0035519150
-
-
10.1116/1.1420492
-
D. Fuard, O. Joubert, L. Vallier, M. Assous, P. Berruyer, and R. Blanc, J. Vac. Sci. Technol. B 19, 2223 (2001). 10.1116/1.1420492
-
(2001)
J. Vac. Sci. Technol. B
, vol.19
, pp. 2223
-
-
Fuard, D.1
Joubert, O.2
Vallier, L.3
Assous, M.4
Berruyer, P.5
Blanc, R.6
-
55
-
-
85067750402
-
-
31st March-1st April, Munich, Germany, IEEEI/SEMI, 2003.
-
P. Mangiagalli, T. Chevolleau, N. Posseme, C. Frum, L. Sabnani, Z. Sui, and M. Assous, Advanced Semiconductor Manufacturing Conference and Workshop, 31st March-1st April, 2003, Munich, Germany, IEEEI/SEMI, 2003.
-
(2003)
Advanced Semiconductor Manufacturing Conference and Workshop
-
-
Mangiagalli, P.1
Chevolleau, T.2
Posseme, N.3
Frum, C.4
Sabnani, L.5
Sui, Z.6
Assous, M.7
-
57
-
-
34547680447
-
-
10.1016/j.surfcoat.2007.04.096
-
P. Verdonck, Surf. Coat. Technol. 201, 9264 (2007). 10.1016/j.surfcoat. 2007.04.096
-
(2007)
Surf. Coat. Technol.
, vol.201
, pp. 9264
-
-
Verdonck, P.1
-
58
-
-
78650896825
-
-
10.1063/1.3518512
-
O. Gourhant, G. Gerbaud, A. Zenasni, L. Favennec, P. Gonon, and V. Jousseaume, J. Appl. Phys. 108, 124105 (2010). 10.1063/1.3518512
-
(2010)
J. Appl. Phys.
, vol.108
, pp. 124105
-
-
Gourhant, O.1
Gerbaud, G.2
Zenasni, A.3
Favennec, L.4
Gonon, P.5
Jousseaume, V.6
-
60
-
-
0034315702
-
-
10.1116/1.1290376
-
T. E. F. M. Standaert, E. A. Joseph, G. S. Oehrlein, A. Jain, W. N. Gill, P. C. Wayner, and J. L. Plawsky, J. Vac. Sci. Technol. A 18, 2742 (2000). 10.1116/1.1290376
-
(2000)
J. Vac. Sci. Technol. A
, vol.18
, pp. 2742
-
-
Standaert, T.E.F.M.1
Joseph, E.A.2
Oehrlein, G.S.3
Jain, A.4
Gill, W.N.5
Wayner, P.C.6
Plawsky, J.L.7
-
61
-
-
79955994680
-
-
10.1063/1.1501767
-
J.-N. Sun, D. W. Gidley, Y. Hu, W. E. Frieze, and E. T. Ryan, Appl. Phys. Lett. 81, 1447 (2002). 10.1063/1.1501767
-
(2002)
Appl. Phys. Lett.
, vol.81
, pp. 1447
-
-
Sun, J.-N.1
Gidley, D.W.2
Hu, Y.3
Frieze, W.E.4
Ryan, E.T.5
-
62
-
-
33747204617
-
-
10.1016/j.apsusc.2006.02.104
-
P. Lazzeri, X. Hua, G. Oehrlein, E. Iacob, M. Barozzi, M. Bersani, and M. Anderle, Appl. Surf. Sci. 252, 7186 (2006). 10.1016/j.apsusc.2006.02.104
-
(2006)
Appl. Surf. Sci.
, vol.252
, pp. 7186
-
-
Lazzeri, P.1
Hua, X.2
Oehrlein, G.3
Iacob, E.4
Barozzi, M.5
Bersani, M.6
Anderle, M.7
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