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Volumn 31, Issue 1, 2013, Pages

Impact of low-k structure and porosity on etch processes

Author keywords

[No Author keywords available]

Indexed keywords

AUTOMOBILE MANUFACTURE; CARBON FILMS; COPOLYMERS; ION BOMBARDMENT; MECHANICAL PROPERTIES; PLASMAS;

EID: 84872704773     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.4770505     Document Type: Article
Times cited : (25)

References (62)
  • 1
    • 84872708504 scopus 로고    scopus 로고
    • Low-k materials: Recent advances
    • edited by M. Baklanov, P. S. Ho: E. Zschech (John Wiley Sons, Ltd., Chichester, UK), Cha.
    • G. Dubois and W. Volksen, " Low-k materials: Recent advances.," in Advanced Interconnects for ULSI Technology, edited by, M. Baklanov, P. S. Ho,:, E. Zschech, (John Wiley Sons, Ltd., Chichester, UK, 2012), Chap..
    • (2012) Advanced Interconnects for ULSI Technology
    • Dubois, G.1    Volksen, W.2
  • 3
    • 84950317098 scopus 로고    scopus 로고
    • Spin-on dielectric materials
    • edited by M. Baklanov, M. Green, and K. Maex (John Wiley Sons, Ltd., Chichester, UK), Cha.
    • G. Dubois, R. D. Miller, W. Volksen, " Spin-on dielectric materials.," in Dielectric Films for Advanced Microelectronics, edited by, M. Baklanov, M. Green, and, K. Maex, (John Wiley Sons, Ltd., Chichester, UK, 2007), Chap..
    • (2007) Dielectric Films for Advanced Microelectronics
    • Dubois, G.1    Miller, R.D.2    Volksen, W.3
  • 4
    • 0033569683 scopus 로고    scopus 로고
    • 10.1126/science.286.5439.421
    • R. D. Miller, Science 286, 421 (1999). 10.1126/science.286.5439.421
    • (1999) Science , vol.286 , pp. 421
    • Miller, R.D.1
  • 8
  • 22
    • 0347601892 scopus 로고    scopus 로고
    • 10.1016/j.mee.2003.11.006
    • L. Shen and K. Zeng, Microelectron. Eng. 71, 221 (2004). 10.1016/j.mee.2003.11.006
    • (2004) Microelectron. Eng. , vol.71 , pp. 221
    • Shen, L.1    Zeng, K.2
  • 26
    • 79958053613 scopus 로고    scopus 로고
    • 10.1016/j.mee.2011.03.006
    • M. Pantouvaki, Microelectron. Eng. 88, 1618 (2011). 10.1016/j.mee.2011. 03.006
    • (2011) Microelectron. Eng. , vol.88 , pp. 1618
    • Pantouvaki, M.1
  • 27
    • 33751236207 scopus 로고    scopus 로고
    • 10.1016/j.mee.2006.10.021
    • F. Gaillard, Microelectron. Eng. 83, 2309 (2006). 10.1016/j.mee.2006.10. 021
    • (2006) Microelectron. Eng. , vol.83 , pp. 2309
    • Gaillard, F.1
  • 36
    • 85067758237 scopus 로고    scopus 로고
    • Symposium O: Materials, processes, and reliability for advanced interconnects for micro- and nanoelectronics
    • 26-29 April, San Francisco, CA, Abstract O1.3.
    • W. Volksen, " Symposium O: Materials, processes, and reliability for advanced interconnects for micro- and nanoelectronics.," in MRS Spring Meeting 2011, 26-29 April 2011, San Francisco, CA, Abstract O1.3.
    • (2011) MRS Spring Meeting 2011
    • Volksen, W.1
  • 42
    • 3743070568 scopus 로고    scopus 로고
    • 10.1021/la960189l
    • J. Tamayo and R. Garca, Langmuir 12, 4430 (1996). 10.1021/la960189l
    • (1996) Langmuir , vol.12 , pp. 4430
    • Tamayo, J.1    Garca, R.2
  • 57
    • 34547680447 scopus 로고    scopus 로고
    • 10.1016/j.surfcoat.2007.04.096
    • P. Verdonck, Surf. Coat. Technol. 201, 9264 (2007). 10.1016/j.surfcoat. 2007.04.096
    • (2007) Surf. Coat. Technol. , vol.201 , pp. 9264
    • Verdonck, P.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.