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Volumn 286, Issue 5439, 1999, Pages 421-423
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In search of low-k dielectrics
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Author keywords
[No Author keywords available]
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Indexed keywords
COPPER;
POLYMER;
SILICIC ACID;
SILICON DIOXIDE;
CHEMICAL PARAMETERS;
FILM;
MATERIALS;
POLYMERIZATION;
POROSITY;
PRIORITY JOURNAL;
SEMICONDUCTOR;
SHORT SURVEY;
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EID: 0033569683
PISSN: 00368075
EISSN: None
Source Type: Journal
DOI: 10.1126/science.286.5439.421 Document Type: Short Survey |
Times cited : (340)
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References (18)
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