Mechanisms of porous dielectric film modification induced by reducing and oxidizing ash plasmas

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 1928-1940

  Posseme, N ^a   Chevolleau, T ^a   David, T ^a   Darnon, M ^a   Louveau, O ^b   Joubert, O ^a  

^a CEA LETI   (France)

^b STMICROELECTRONICS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; OXIDATION; PLASMAS; POROUS MATERIALS; SPECTROSCOPIC ELLIPSOMETRY; X RAY RADIOGRAPHY;

METHYL GROUP CONSUMPTION; OXIDIZING ASH PLASMAS;

DIELECTRIC FILMS;

EID: 37149039506     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2804615     Document Type: Article

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