Porosimetry measurements on low dielectric constant-thin layers by coupling spectroscopic ellipsometry and solvent adsorption-desorption

Journal of Porous Materials

Volumn 12, Issue 2, 2005, Pages 113-121

  Revol, Patrick ^d   Perret, Damien ^d   Bertin, François ^a   Fusalba, Florence ^b   Rouessac, Vincent ^c   Chabli, Amal ^a   Passemard, Gérard ^b   Ayral, André ^c  

^a CEA LETI   (France)

^b CEA GRENOBLE   (France)

^c UNIVERSITÉ DE MONTPELLIER   (France)

^d NONE

Author keywords

Adsorption desorption isotherms; Ellipsometric porosimetry; Mesopore size distribution; ULK layers

Indexed keywords

ADSORPTION ISOTHERMS; DESORPTION; ELLIPSOMETRY; MESOPOROUS MATERIALS; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

ADSORPTION-DESORPTION ISOTHERMS; ELLIPSOMETRIC POROSIMETRY; MESOPORE SIZE DISTRIBUTIONS; ULK LAYERS;

THIN FILMS;

EID: 22544475043     PISSN: 13802224     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10934-005-6768-9     Document Type: Article

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