SCOPUS 정보 검색 플랫폼

Volumn 108, Issue 1, 2010, Pages

Roughening of porous SiCOH materials in fluorocarbon plasmas

(9) Bailly, F a David, T b Chevolleau, T b Darnon, M b Posseme, N b Bouyssou, R b Ducote, J a,b Joubert, O b Cardinaud, C c

a STMICROELECTRONICS (France)

b CEA LETI (France)

c UNIVERSITÉ DE NANTES (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; POROUS MATERIALS; TITANIUM NITRIDE;

CORRELATION LENGTHS; FLUOROCARBON PLASMA; MATERIAL DENSITY; METALLIC MASKS; METALLIC PARTICLES; MICROMASKING; PORE NETWORKS; ROOT MEAN SQUARE ROUGHNESS;

SILICON COMPOUNDS;

EID: 77955225051 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3446820 Document Type: Article

Times cited : (29)

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